Substrate treatment systems using supercritical fluid

Patent metadata

Field	Value
Publication number	US-9027576-B2
Application number	US-201313844149-A
Country	US
Kind code	B2
Filing date	Mar 15, 2013
Priority date	Mar 12, 2013
Publication date	May 12, 2015
Grant date	May 12, 2015

Abstract

Substrate treatment systems are provided. The substrate treatment systems may include a treating device configured to treat a substrate with a supercritical fluid, and a supplying device configured to supply the supercritical fluid to the treating device. The treating device may include a supercritical process zone in which the substrate is treated with the supercritical fluid, and a pre-supercritical process zone in which the supercritical fluid is expanded and then provided into the supercritical process zone to create a supercritical state in the supercritical process zone.

First claim

What is claimed is:

1. An apparatus for treating a substrate, the apparatus including:
a process chamber whose bottom portion is recessed to form a recess therein, the process chamber including:
a pre-supercritical process zone to receive a supercritical fluid therein, the recess defining a substantial portion of the pre-supercritical process zone;
a supercritical process zone in fluid communication with the pre-supercritical process zone, the supercritical process zone configured to enable treating a substrate therein using the supercritical fluid;
a blocking plate to cover the pre-supercritical process zone; and
a plurality of supporting parts to support the blocking plate, the plurality of supporting parts disposed outside the recess,
wherein the pre-supercritical process zone is arranged and structured to permit expansion of the supercritical fluid before the supercritical fluid reaches the supercritical process zone, and
wherein the pre-supercritical process zone and the supercritical process zone are divided from each other by the blocking plate.

2. The apparatus of claim 1 , wherein impurities contained in the supercritical fluid are condensed or deposited during the expansion such that a substantial portion of the impurities are confined within the pre-supercritical process zone.

3. The apparatus of claim 2 , wherein the substantial portion of the impurities contained in the supercritical fluid are adhered to a wall defining the pre-supercritical process zone.

4. The apparatus of claim 1 , wherein the blocking plate has a circular shape in plan view.

5. The apparatus of claim 4 , wherein the supporting parts are disposed along a circumferential edge of the blocking plate to support the blocking plate a predetermined distance above a bottom surface of the pre-supercritical process zone, the supporting parts spaced apart from each other.

6. The apparatus of claim 5 , wherein a step region is defined between the pre-supercritical process zone and the supercritical process zone, and wherein the supporting parts are disposed within the step region.

7. The apparatus of claim 5 , wherein one or more passages are defined by the blocking plate, a surface of the pre-supercritical process zone, and the supporting parts.

8. The apparatus of claim 1 , wherein the plurality of supporting parts extend along a circumferential edge of the blocking plate and spaced apart from each other such that one or more passages are defined between the plurality of supporting parts, the one or more passages acting as an expansion nozzle through which the supercritical fluid is expanded while moving into the supercritical process zone from the pre-supercritical process zone.

Assignees

• Cho Yong-Jhin
• Ko Yongsun
• Kim Kyoungseob
• Kim Kwangsu
• Kim Seokhoon
• Oh Jung-Min
• Lee Kuntack
• Jang Wonho
• Jun Yongmyung
• Samsung Electronics Co Ltd

Inventors

• Cho Yong-Jhin
• Ko Yongsun
• Kim Kyoungseob
• Kim Kwangsu
• Kim Seokhoon
• Oh Jung-Min
• Lee Kuntack
• Jang Wonho
• Jun Yongmyung

Classifications

• H10P72/0424

  using mainly spraying means, e.g. nozzles · CPC title

• H10P72/0414

  using mainly spraying means, e.g. nozzles · CPC title

• H10P72/0402 Primary

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• H10P72/7624

  characterised by the mechanical construction of the susceptor, stage or support · CPC title

• H10P72/3308

  Vertical transfer of a single workpiece · CPC title