Vacuum processing apparatus and operating method of vacuum processing apparatus

US9011065B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9011065-B2
Application numberUS-87133310-A
CountryUS
Kind codeB2
Filing dateAug 30, 2010
Priority dateNov 12, 2009
Publication dateApr 21, 2015
Grant dateApr 21, 2015

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A vacuum processing apparatus which includes an atmospheric transfer chamber having a plurality of cassette stands for transferring a wafer, a lock chamber for storing the wafer, a first vacuum transfer chamber to which the wafer from the lock chamber is transferred, a transfer intermediate chamber connected to the first vacuum transfer chamber, and a second vacuum transfer chamber connected to the transfer intermediate chamber. At least one vacuum processing chamber is connected to the first vacuum transfer chamber, and two or more vacuum processing chambers are connected to a rear side of the second vacuum transfer chamber. A plurality of gate valves are disposed between the first vacuum transfer chamber and each of the lock chamber, the transfer intermediate chamber, and the vacuum processing chamber coupled to the first vacuum transfer chamber. A control unit is also provided for controlling operation of the gate valves.

First claim

Opening claim text (preview).

What is claimed is: 1. A vacuum processing apparatus which processes a semiconductor wafer, comprising: an atmospheric transfer chamber having a plurality of cassette stands arranged on a front side thereof for transferring the wafer inside thereof, the wafer being stored in a cassette disposed on one of the plurality of cassette stands; a lock chamber arranged on a rear side of the atmospheric transfer chamber, for storing in an interior thereof the wafer transferred from the a…

Assignees

Inventors

Classifications

Patent family

Related publications grouped by family.

External sources

Next steps

Free tools are coming soon. Tell us what you want to track and we'll notify you.

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US9011065B2 cover?
A vacuum processing apparatus which includes an atmospheric transfer chamber having a plurality of cassette stands for transferring a wafer, a lock chamber for storing the wafer, a first vacuum transfer chamber to which the wafer from the lock chamber is transferred, a transfer intermediate chamber connected to the first vacuum transfer chamber, and a second vacuum transfer chamber connected to…
Who is the assignee on this patent?
Tauchi Susumu, Kondo Hideaki, Nakata Teruo, and 4 more
What technology area does this patent fall under?
Primary CPC classification H10P72/0461. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Apr 21 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).