Film structure for electric field guided photoresist patterning process
US-11880137-B2 · Jan 23, 2024 · US
Plasma activated conformal dielectric film deposition
US8999859B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8999859-B2 |
| Application number | US-201314133239-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 18, 2013 |
| Priority date | Apr 15, 2010 |
| Publication date | Apr 7, 2015 |
| Grant date | Apr 7, 2015 |
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Abstract
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Methods of depositing a film on a substrate surface include surface mediated reactions in which a film is grown over one or more cycles of reactant adsorption and reaction. In one aspect, the method is characterized by intermittent delivery of dopant species to the film between the cycles of adsorption and reaction.
First claim
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The invention claimed is: 1. An apparatus for depositing a doped film on a substrate surface, the apparatus comprising: a reaction chamber comprising a device for holding the substrate during deposition of the doped film; one or more process gas inlets coupled to the reaction chamber; and a controller designed or configured to operate the apparatus to perform the following operations: (a) introducing a first reactant into the reaction chamber under conditions allowing the fir…
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Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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- What does patent US8999859B2 cover?
- Methods of depositing a film on a substrate surface include surface mediated reactions in which a film is grown over one or more cycles of reactant adsorption and reaction. In one aspect, the method is characterized by intermittent delivery of dopant species to the film between the cycles of adsorption and reaction.
- Who is the assignee on this patent?
- Novellus Systems Inc
- What technology area does this patent fall under?
- Primary CPC classification H10P14/6903. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Apr 07 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).