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US-2017370799-A1 · Dec 28, 2017 · US
Method for producing hollow nanoparticle comprising deposition on/in an ionic liquid, hollow nanoparticle, and dispersion liquid thereof
US8999225B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8999225-B2 |
| Application number | US-201013508217-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 9, 2010 |
| Priority date | Nov 11, 2009 |
| Publication date | Apr 7, 2015 |
| Grant date | Apr 7, 2015 |
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Abstract
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First, an ionic liquid is placed on a glass slide, which is then installed in an evaporation apparatus, and a metal (for example, indium) is mounted as a target material at a position facing the ionic liquid, followed by sputter deposition of the metal. After sputtering, the ionic liquid containing nanoparticles dispersed therein is recovered. The nanoparticles are solid nanoparticles. Next, the ionic liquid containing the solid nanoparticles dispersed therein is placed in a test tube and then oxidized by heating in air at 250° C. for 1 hour. As a result, hollow nanoparticles having cavities formed in core portions of the solid nanoparticles are produced.
First claim
Opening claim text (preview).
The invention claimed is: 1. A method for producing hollow nanoparticles comprising: (a) depositing a first metal and a second metal which is less oxidizable than the first metal onto or into an ionic liquid, thereby forming solid nanoparticles of an alloy composed of the first and second metals dispersed in the ionic liquid; and (b) oxidizing the solid nanoparticles dispersed in the ionic liquid in a gas atmosphere containing oxidizing gas to produce hollow nanoparticles having…
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Operations & Transport · mapped topic
Operations & Transport · mapped topic
Operations & Transport · mapped topic
Operations & Transport · mapped topic
Operations & Transport · mapped topic
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Frequently asked questions
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- What does patent US8999225B2 cover?
- First, an ionic liquid is placed on a glass slide, which is then installed in an evaporation apparatus, and a metal (for example, indium) is mounted as a target material at a position facing the ionic liquid, followed by sputter deposition of the metal. After sputtering, the ionic liquid containing nanoparticles dispersed therein is recovered. The nanoparticles are solid nanoparticles. Next, th…
- Who is the assignee on this patent?
- Torimoto Tsukasa, Okazaki Ken-Ichi, Suzuki Toshimasa, and 4 more
- What technology area does this patent fall under?
- Primary CPC classification B81C99/0045. Mapped technology areas include Operations & Transport.
- When was this patent published?
- Publication date Tue Apr 07 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).