Ceramic fibers for shielding in vacuum chamber systems and methods for using same
US-2024304424-A1 · Sep 12, 2024 · US
Chamber cleaning method
US8999068B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8999068-B2 |
| Application number | US-87345810-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 1, 2010 |
| Priority date | Sep 3, 2009 |
| Publication date | Apr 7, 2015 |
| Grant date | Apr 7, 2015 |
How to read this patent
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
- Title
What the patent document calls the invention.
- Abstract
A short plain-language summary of the technical disclosure.
- Assignees and inventors
Who owns or filed the patent and who is credited as inventor.
- Key dates
Filing, priority, publication, and grant dates set the timeline.
- First independent claim
The legal scope of protection — read this for what is actually claimed.
- CPC / IPC classifications
Technology tags used to group this patent with similar filings.
- Citations and related patents
Prior art links and similar publications in this corpus.
Abstract
Official abstract text for this publication.
Provided is a chamber cleaning method capable of efficiently removing a CF-based shoulder deposit containing Si and Al deposited on an outer periphery of an ESC. A mixed gas of an O 2 gas and a F containing gas is supplied toward an outer periphery 24 a of an ESC 24 at a pressure ranging from about 400 mTorr to about 800 mTorr; plasma generated from the mixed gas is irradiated onto the outer periphery 24 a of the ESC 24 ; an O 2 single gas as a mask gas is supplied to the top surface of ESC 24 except the outer periphery 24 a ; and the shoulder deposit 50 adhered to the outer periphery 24 a is decomposed and removed while preventing the top surface of ESC 24 except the outer periphery 24 a from being exposed to a F radical.
First claim
Opening claim text (preview).
What is claimed is: 1. A chamber cleaning method for removing a CF-based deposit containing at least one of Si and metal adhered to an outer periphery of a table-shaped electrostatic chuck which is installed in a chamber of a substrate processing apparatus configured to perform a plasma process on a substrate and is configured to mount the substrate thereon, the method comprising: supplying a mixed gas of an oxygen gas and a fluorine-containing gas toward the outer periphery of th…
Assignees
Inventors
Classifications
- H01J37/32862Primary
Electricity · mapped topic
- C23C16/4405Primary
Chemistry & Metallurgy · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Patent family
Related publications grouped by family.
External sources
Next steps
Free tools are coming soon. Tell us what you want to track and we'll notify you.
Frequently asked questions
Answers are generated from the same data shown on this page.
- What does patent US8999068B2 cover?
- Provided is a chamber cleaning method capable of efficiently removing a CF-based shoulder deposit containing Si and Al deposited on an outer periphery of an ESC. A mixed gas of an O 2 gas and a F containing gas is supplied toward an outer periphery 24 a of an ESC 24 at a pressure ranging from about 400 mTorr to about 800 mTorr; plasma generated from the mixed gas is irradiated onto the o…
- Who is the assignee on this patent?
- Honda Masanobu, Hanaoka Hidetoshi, Hirano Taichi, and 4 more
- What technology area does this patent fall under?
- Primary CPC classification H01J37/32862. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Apr 07 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).