Multiple-channel flow ratio controller

US8997791B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8997791-B2
Application numberUS-27978606-A
CountryUS
Kind codeB2
Filing dateApr 14, 2006
Priority dateApr 14, 2006
Publication dateApr 7, 2015
Grant dateApr 7, 2015

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Abstract

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A system for dividing a single mass flow into a plurality N of secondary flows includes an inlet configured to receive the single mass flow, a master FRC (flow ratio controller), and one or more slave FRCs. Each FRC is connected to the inlet and including at least one flow channel. The master FRC and the slave FRCs include in combination a total of N flow channels. Each flow channel i (i=1, . . . , N) is connected to carry a corresponding one of the N secondary flows. In response to preselected ratio setpoints received from a host controller, the master FRC and the slave FRCs maintain ratios Q i /Q T (i=1, . . . , N) between individual flow rates Q i (i=1, . . . , N) and a total flow rate Q T at the preselected ratio set points.

First claim

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What is claimed is: 1. A method of controlling flow in a plurality N of secondary flows that drive from a single mass flow, that is combined in an outlet manifold from two or more mass flows from a plurality of gas suppliers, each of the two or more mass flows individually being metered through a respective mass flow controller, the method comprising: connecting a master FRC and one or more slave FRCs to an inlet configured to receive the single mass flow, the master FRC and the s…

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What does patent US8997791B2 cover?
A system for dividing a single mass flow into a plurality N of secondary flows includes an inlet configured to receive the single mass flow, a master FRC (flow ratio controller), and one or more slave FRCs. Each FRC is connected to the inlet and including at least one flow channel. The master FRC and the slave FRCs include in combination a total of N flow channels. Each flow channel i (i=1, . .…
Who is the assignee on this patent?
L Bassi Michael, Ding Junhua, D Entremont David, and 1 more
What technology area does this patent fall under?
Primary CPC classification G05D7/0664. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Apr 07 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).