Semiconductor device and method of manufacturing the same

US8994034B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8994034-B2
Application numberUS-201213404411-A
CountryUS
Kind codeB2
Filing dateFeb 24, 2012
Priority dateSep 9, 2011
Publication dateMar 31, 2015
Grant dateMar 31, 2015

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Disclosed is a semiconductor device including: a first electrode formed of a conductive material; a p-type first silicon carbide (SiC) semiconductor section and an n-type second SiC semiconductor section 230 , connected to the first electrode, containing carbon (C) such that a surface density distribution has a peak at a first interface with the first electrode.

First claim

Opening claim text (preview).

What is claimed is: 1. A semiconductor device comprising: a first electrode formed of a conductive material; a p-type first silicon carbide (SiC) semiconductor section, connected to the first electrode, containing carbon (C) such that a surface density distribution has a peak less than 1 nm from a first interface with the first electrode; and an n-type second SiC semiconductor section connected to the first electrode, wherein carbon at the first interface is equal to or smal…

Assignees

Inventors

Classifications

Patent family

Related publications grouped by family.

External sources

Next steps

Free tools are coming soon. Tell us what you want to track and we'll notify you.

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US8994034B2 cover?
Disclosed is a semiconductor device including: a first electrode formed of a conductive material; a p-type first silicon carbide (SiC) semiconductor section and an n-type second SiC semiconductor section 230 , connected to the first electrode, containing carbon (C) such that a surface density distribution has a peak at a first interface with the first electrode.
Who is the assignee on this patent?
Shimizu Tatsuo, Tsuchiya Yoshinori, Shinohe Takashi, and 1 more
What technology area does this patent fall under?
Primary CPC classification H10D64/01366. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Mar 31 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).