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US-2024246901-A1 · Jul 25, 2024 · US
Oxetane-ring-containing (meth)acrylic acid ester compound
US8993790B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8993790-B2 |
| Application number | US-201013510144-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 5, 2010 |
| Priority date | Nov 17, 2009 |
| Publication date | Mar 31, 2015 |
| Grant date | Mar 31, 2015 |
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Abstract
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Provide is an oxetane-ring containing (meth) acrylic ester compound which can give, through polymerization, a cured article being highly flexible or thermally stable. The oxetane-ring-containing (meth) acrylic ester compound is represented by formula (1) below, in which R 1 represents a hydrogen atom or an alkyl group; R 2 represent a hydrogen atom or a methyl group; and “A” represent either a linear alkylene group represented by following formula (a1) or a branched-chain alkylene group represented by following formula (a2).
First claim
Opening claim text (preview).
The invention claimed is: 1. An oxetane-ring-containing (meth)acrylic ester compound represented by Formula (1): wherein R 1 represents a hydrogen atom or an alkyl group; R 2 represents a hydrogen atom or a methyl group; “A” represents either a linear alkylene group represented by Formula (a1) or a branched-chain alkylene group represented by Formula (a2):…
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Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
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- What does patent US8993790B2 cover?
- Provide is an oxetane-ring containing (meth) acrylic ester compound which can give, through polymerization, a cured article being highly flexible or thermally stable. The oxetane-ring-containing (meth) acrylic ester compound is represented by formula (1) below, in which R 1 represents a hydrogen atom or an alkyl group; R 2 represent a hydrogen atom or a methyl group; and “A” represent either …
- Who is the assignee on this patent?
- Son Tamaki, Ikura Kiyoshi, Daicel Corp
- What technology area does this patent fall under?
- Primary CPC classification C07D305/06. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Mar 31 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).