Ultra high selectivity doped amorphous carbon strippable hardmask development and integration

US8993454B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8993454-B2
Application numberUS-201314028025-A
CountryUS
Kind codeB2
Filing dateSep 16, 2013
Priority dateOct 5, 2010
Publication dateMar 31, 2015
Grant dateMar 31, 2015

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Abstract

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Embodiments of the present invention generally relate to the fabrication of integrated circuits and particularly to the deposition of a boron containing amorphous carbon layer on a semiconductor substrate. In one embodiment, a boron-containing amorphous carbon film is disclosed. The boron-containing amorphous carbon film comprises from about 10 to 60 atomic percentage of boron, from about 20 to about 50 atomic percentage of carbon, and from about 10 to about 30 atomic percentage of hydrogen.

First claim

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The invention claimed is: 1. A method of processing a substrate in a processing chamber, comprising: exposing a substrate to a flow of a hydrocarbon-containing gas and a flow of a boron-containing gas mixture in the presence of RF power to deposit a boron-containing amorphous carbon film over the substrate, wherein the boron-containing gas mixture is provided into the processing chamber at a flow rate of about 5,000 sccm to about 15,000 sccm, and wherein the boron-containing gas m…

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What does patent US8993454B2 cover?
Embodiments of the present invention generally relate to the fabrication of integrated circuits and particularly to the deposition of a boron containing amorphous carbon layer on a semiconductor substrate. In one embodiment, a boron-containing amorphous carbon film is disclosed. The boron-containing amorphous carbon film comprises from about 10 to 60 atomic percentage of boron, from about 20 to…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification H10P14/6336. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Mar 31 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).