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US-2023349043-A1 · Nov 2, 2023 · US
Methods and apparatus for forming tantalum silicate layers on germanium or III-V semiconductor devices
US8993058B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8993058-B2 |
| Application number | US-201314010639-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 27, 2013 |
| Priority date | Aug 28, 2012 |
| Publication date | Mar 31, 2015 |
| Grant date | Mar 31, 2015 |
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Abstract
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Described are apparatus and methods for forming tantalum silicate layers on germanium or III-V materials. Such tantalum silicate layers may have Si/(Ta+Si) atomic ratios from about 0.01 to about 0.15. The tantalum silicate layers may be formed by atomic layer deposition of silicon oxide and tantalum oxide, followed by interdiffusion of the silicon oxide and tantalum oxide layers.
First claim
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What is claimed is: 1. A method of processing a substrate comprising: depositing a silicon oxide layer on a substrate having a germanium or III-V semiconductor surface; depositing a tantalum oxide layer on the silicon oxide layer; and diffusing the tantalum oxide layer into the silicon oxide layer to provide a tantalum silicate layer having a Si/(Ta+Si) ratio in the range from about 0.01 to about 0.15. 2. The method of claim 1 , wherein diffusing the tan…
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Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
- H10P14/6931Primary
Electricity · mapped topic
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- What does patent US8993058B2 cover?
- Described are apparatus and methods for forming tantalum silicate layers on germanium or III-V materials. Such tantalum silicate layers may have Si/(Ta+Si) atomic ratios from about 0.01 to about 0.15. The tantalum silicate layers may be formed by atomic layer deposition of silicon oxide and tantalum oxide, followed by interdiffusion of the silicon oxide and tantalum oxide layers.
- Who is the assignee on this patent?
- Applied Materials Inc
- What technology area does this patent fall under?
- Primary CPC classification H10P14/6931. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Mar 31 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).