Pattern forming method
US-9207531-B2 · Dec 8, 2015 · US
US8986924B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8986924-B2 |
| Application number | US-201414158890-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 20, 2014 |
| Priority date | Mar 19, 2013 |
| Publication date | Mar 24, 2015 |
| Grant date | Mar 24, 2015 |
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A thiosulfate polymer composition includes an electron-accepting photosensitizer component, either as a separate compound or as an attachment to the thiosulfate polymer. The thiosulfate polymer composition can be applied to various articles, or used to form a predetermined polymeric pattern after photothermal reaction to form crosslinked disulfide bonds, removing non-crosslinked polymer, and reaction with a disulfide-reactive material. Such thiosulfate polymer compositions can also be used to sequestering metals.
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The invention claimed is: 1. A method of sequestering metal in a polymeric composition, the method comprising: providing a polymeric layer comprising a non-crosslinked thiosulfate polymer that also comprises pendant organic charged groups, photochemically reacting the non-crosslinked thiosulfate polymer to provide polymer layer areas comprising a crosslinked polymer having disulfide groups in a predetermined pattern in the polymeric layer, and polymeric layer areas outside the p…
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