Vapor deposition apparatus, method of forming thin film by using vapor deposition apparatus, and method of manufacturing organic light emitting display apparatus
US-9224612-B2 · Dec 29, 2015 · US
Method for producing functional film
US8980374B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8980374-B2 |
| Application number | US-36334809-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 30, 2009 |
| Priority date | Jan 31, 2008 |
| Publication date | Mar 17, 2015 |
| Grant date | Mar 17, 2015 |
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Abstract
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A functional film having a particular organic film and a particular inorganic film is produced. The functional film is consistently produced and exhibits the intended performance. The functional film production method includes forming an organic film on a surface of a substrate, handling the substrate having the organic film formed thereon so that no member comes in contact with an organic film surface in vacuum until formation of an inorganic film, and forming the inorganic film by vacuum deposition on the organic film surface.
First claim
Opening claim text (preview).
What is claimed is: 1. A method for producing a functional film comprising the steps of: forming an organic film on a surface of a substrate; handling the substrate having the organic film formed on the surface of the substrate so that no member comes in contact with an organic film surface in vacuum until formation of an inorganic film; and forming the inorganic film by vacuum deposition on the organic film surface to produce the functional film, wherein the organic film is…
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Operations & Transport · mapped topic
Operations & Transport · mapped topic
Operations & Transport · mapped topic
Chemistry & Metallurgy · mapped topic
Operations & Transport · mapped topic
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Frequently asked questions
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- What does patent US8980374B2 cover?
- A functional film having a particular organic film and a particular inorganic film is produced. The functional film is consistently produced and exhibits the intended performance. The functional film production method includes forming an organic film on a surface of a substrate, handling the substrate having the organic film formed thereon so that no member comes in contact with an organic film…
- Who is the assignee on this patent?
- Nakagame Masami, Nishida Hiroyuki, Kadota Norihiro, and 3 more
- What technology area does this patent fall under?
- Primary CPC classification C23C16/545. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Mar 17 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).