Apparatus and methods for pulsed photo-excited deposition and etch
US-2015368800-A1 · Dec 24, 2015 · US
Conditioning method, computer readable storage medium and substrate processing apparatus
US8980366B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8980366-B2 |
| Application number | US-201213433509-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 29, 2012 |
| Priority date | Mar 31, 2011 |
| Publication date | Mar 17, 2015 |
| Grant date | Mar 17, 2015 |
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Abstract
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In a conditioning method conditions interiors of a plurality of process chambers of a substrate processing apparatus, conditioning of the interior of the first process chamber is performed if a first integrated value set in connection with the process of the substrate reaches a set value N1. The second process chamber is set in a standby state when the conditioning of the first process chamber starts and the series of processes is stopped. By determining whether a second integrated value set in connection with process of the substrate in the second process chamber is equal to or greater than a set value N2, count of a third integrated value in the second process chamber is started if the second integrated value is equal to or greater than the set value N2. A conditioning of the second process chamber is performed if the third integrated value exceeds a set value N3.
First claim
Opening claim text (preview).
What is claimed is: 1. A conditioning method for conditioning interiors of a plurality of process chambers of a substrate processing apparatus in which predetermined processes are performed on a substrate, the process chambers including a first and a second process chamber combined to perform a series of processes for the substrate, the method comprising: performing conditioning of the interior of the first process chamber if a first integrated value set in connection with the pro…
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- C23C16/00Primary
Chemistry & Metallurgy · mapped topic
- C23C16/4401Primary
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Electricity · mapped topic
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- What does patent US8980366B2 cover?
- In a conditioning method conditions interiors of a plurality of process chambers of a substrate processing apparatus, conditioning of the interior of the first process chamber is performed if a first integrated value set in connection with the process of the substrate reaches a set value N1. The second process chamber is set in a standby state when the conditioning of the first process chamber …
- Who is the assignee on this patent?
- Chino Takashi, Aoki Yojiro, Tokyo Electron Ltd
- What technology area does this patent fall under?
- Primary CPC classification C23C16/00. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Mar 17 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).