MEMS devices

US8969979B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8969979-B2
Application numberUS-201314132328-A
CountryUS
Kind codeB2
Filing dateDec 18, 2013
Priority dateDec 2, 2011
Publication dateMar 3, 2015
Grant dateMar 3, 2015

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method includes forming a Micro-Electro-Mechanical System (MEMS) device on a front surface of a substrate. After the step of forming the MEMS device, a through-opening is formed in the substrate, wherein the through-opening is formed from a backside of the substrate. The through-opening is filled with a dielectric material, which insulates a first portion of the substrate from a second portion of the substrate. An electrical connection is formed on the backside of the substrate. The electrical connection is electrically coupled to the MEMS device through the first portion of the substrate.

First claim

Opening claim text (preview).

What is claimed is: 1. A device comprising: a substrate; a Micro-Electro-Mechanical System (MEMS) device on a front surface of the substrate; a dielectric material penetrating through the substrate, wherein the dielectric material forms a ring, wherein an entirety of the ring is formed of a homogeneous material, and wherein the ring separates the substrate into: a first portion encircled by the ring; and a second portion outside of the ring, wherein the first portion is ele…

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What does patent US8969979B2 cover?
A method includes forming a Micro-Electro-Mechanical System (MEMS) device on a front surface of a substrate. After the step of forming the MEMS device, a through-opening is formed in the substrate, wherein the through-opening is formed from a backside of the substrate. The through-opening is filled with a dielectric material, which insulates a first portion of the substrate from a second portio…
Who is the assignee on this patent?
Taiwan Semiconductor Mfg
What technology area does this patent fall under?
Primary CPC classification B81B3/0021. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Mar 03 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).