Extreme ultraviolet light generation apparatus
US-2016370706-A1 · Dec 22, 2016 · US
Droplet generator with actuator induced nozzle cleaning
US8969840B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8969840-B2 |
| Application number | US-201414452418-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 5, 2014 |
| Priority date | Feb 21, 2006 |
| Publication date | Mar 3, 2015 |
| Grant date | Mar 3, 2015 |
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Abstract
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Systems (and methods therefor) for generating EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source includes a fluid exiting an orifice and a sub-system having an electro-actuatable element producing a disturbance in the fluid. The electro-actuatable element is driven by a first waveform to produce droplets for irradiation to generate the EUV radiation, the droplets produced by the first waveform having differing initial velocities causing at least some adjacent droplets to coalesce as the droplets travel to the irradiation region, and a second waveform, different from the first waveform, to dislodge contaminants from the orifice.
First claim
Opening claim text (preview).
What is claimed is: 1. A device comprising: a plasma generating system comprising a source of target material droplets and a laser producing a beam irradiating the droplets at an irradiation region to form a plasma, the plasma producing EUV radiation, wherein the droplet source is configured to elect a fluid from an orifice and a sub-system producing a first disturbance in the fluid during a first time period which generates droplets having differing initial velocities causing the…
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- H05G2/0023Primary
Electricity · mapped topic
Physics · mapped topic
Electricity · mapped topic
- H05G2/003Primary
Electricity · mapped topic
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- What does patent US8969840B2 cover?
- Systems (and methods therefor) for generating EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source includes a fluid exiting an orifice and a sub-system having an electro-actuatable element producing a disturbance in the fluid. The electro-actuatable element is driven by a first waveform to produce droplets f…
- Who is the assignee on this patent?
- Asml Netherlands Bv
- What technology area does this patent fall under?
- Primary CPC classification H05G2/0023. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Mar 03 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).