Method of manufacturing EUV photo masks
US-12085843-B2 · Sep 10, 2024 · US
Laser produced plasma EUV light source
US8969839B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8969839-B2 |
| Application number | US-201414294048-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 2, 2014 |
| Priority date | Jul 13, 2007 |
| Publication date | Mar 3, 2015 |
| Grant date | Mar 3, 2015 |
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Abstract
Official abstract text for this publication.
Methods and apparatus for producing irradiation targets in an extreme ultraviolet (EUV) light source having an irradiation target generating system that includes a nozzle configured for ejecting droplets of a target material, and a subsystem having an electro-actuable element producing a modulation waveform to cause disturbance to the droplets thereby causing at least some of the droplets to coalesce into irradiation targets. There is included a laser producing a beam for irradiating the irradiation targets to generate an EUV-producing plasma, wherein the electro-actuable element is biased against the nozzle to enable transfer of the disturbance to the droplets while permitting relative movement between the electro-actuable element and the nozzle.
First claim
Opening claim text (preview).
What is claimed is: 1. A method for generating irradiation targets in an extreme ultraviolet (EUV) light source having a plasma generating system, the plasma generating system includes a nozzle configured for ejecting droplets of a target material and a subsystem having an electro-actuable element producing a modulation waveform to cause disturbance to the droplets thereby causing at least some of the droplets to coalesce into at least one of the irradiation targets, the plasma gen…
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Classifications
Electricity · mapped topic
- G03F7/70033Primary
Physics · mapped topic
- H05H1/42Primary
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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Frequently asked questions
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- What does patent US8969839B2 cover?
- Methods and apparatus for producing irradiation targets in an extreme ultraviolet (EUV) light source having an irradiation target generating system that includes a nozzle configured for ejecting droplets of a target material, and a subsystem having an electro-actuable element producing a modulation waveform to cause disturbance to the droplets thereby causing at least some of the droplets to co…
- Who is the assignee on this patent?
- Asml Netherlands Bv, Asml Netherlands Bv
- What technology area does this patent fall under?
- Primary CPC classification G03F7/70033. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Mar 03 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).