Biometric identification device
US-2015373018-A1 · Dec 24, 2015 · US
System and method for defect analysis of a substrate
US8965102B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8965102-B2 |
| Application number | US-201213673664-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 9, 2012 |
| Priority date | Nov 9, 2012 |
| Publication date | Feb 24, 2015 |
| Grant date | Feb 24, 2015 |
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Abstract
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The present disclosure provides a method including providing a first image and a second image. The first image is of a substrate having a defect and the second image is of a reference substrate. A difference between the first image and the second image is determined. A simulation model is used to generate a simulation curve corresponding to the difference and the substrate dispositioned based on the simulation curve. In another embodiment, the scan of a substrate is used to generate a statistical process control chart.
First claim
Opening claim text (preview).
What is claimed is: 1. A method, comprising: providing a first pseudo-color image and a second pseudo-color image, wherein the first pseudo-color image is of a substrate scanned at a first point in time and the second pseudo-color image is of the substrate scanned at a second point in time, wherein the second point in time is at least one day later than the first point of time; determining, using an image analysis computing system, a difference between the first pseudo-color ima…
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- G06K9/03Primary
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
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- What does patent US8965102B2 cover?
- The present disclosure provides a method including providing a first image and a second image. The first image is of a substrate having a defect and the second image is of a reference substrate. A difference between the first image and the second image is determined. A simulation model is used to generate a simulation curve corresponding to the difference and the substrate dispositioned based o…
- Who is the assignee on this patent?
- Taiwan Semiconductor Mfg
- What technology area does this patent fall under?
- Primary CPC classification G06K9/03. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Feb 24 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).