Multiple anode ion source

Patent metadata

Field	Value
Publication number	US-8946651-B2
Application number	US-201113192251-A
Country	US
Kind code	B2
Filing date	Jul 27, 2011
Priority date	Jul 24, 2008
Publication date	Feb 3, 2015
Grant date	Feb 3, 2015

Abstract

An ion source is provided. The ion source comprises a first cylindrical anode and a second cylindrical anode. The first cylindrical anode is concentric with the second cylindrical anode. The ion source further comprises an electron source positioned within the first cylindrical anode or the second cylindrical anode.

First claim

What is claimed is:

1. An ion source for ion beam deposition comprising:
a first cylindrical anode having a first overall diameter;
a second cylindrical anode having a second overall diameter greater than the first overall diameter, the first cylindrical anode being concentric with and axially offset from the second cylindrical anode along a common central axis so as to protrude closer to a substrate than the second cylindrical anode; and
an electron source positioned within the first cylindrical anode or the second cylindrical anode.

2. The ion source of claim 1 , further comprising:
a first voltage source input configured to apply a first voltage to the first cylindrical anode to deposit a first thickness of a source material in a first zone on the substrate; and
a second voltage source input configured to apply a second voltage to the second cylindrical anode to deposit a second thickness of the source material in a second zone on the substrate,
wherein the first thickness is different than the second thickness.

3. The ion source of claim 2 , wherein the first voltage source input applies the first voltage from a voltage source, and wherein the second voltage source input applies the second voltage from the same voltage source.

4. The ion source of claim 2 , wherein a first edge of the first cylindrical anode is offset from a corresponding edge of the second cylindrical anode such that the first edge of the first cylindrical anode is configured to be positioned closer to the substrate than the corresponding edge of the second cylindrical anode during use.

5. The ion source of claim 2 , wherein the first zone is closer to the center of the substrate than the second zone, wherein the first voltage applied to the first anode is greater than the second voltage applied to the second anode such that the first thickness of the source material deposited in the first zone of the substrate is greater than the second thickness of the source material deposited in the second zone.

6. The ion source of claim 2 , wherein the source material is carbon.

7. The ion source of claim 2 , wherein the substrate comprises a glass material.

8. A method of depositing multiple concentric zones of a source material on a substrate, wherein respective thicknesses of the concentric zones are different, the method comprising:
placing an ion source in front of the substrate, the ion source comprising a first cylindrical anode, a second cylindrical anode, and an electron source, the first and second cylindrical anodes concentric about a common central axis with the first cylindrical anode offset with respect to the second cylindrical anode along the common central axis so as to protrude from the second cylindrical anode in a direction toward the substrate with the first anode closer to the substrate than the second anode and having an overall diameter smaller than an overall diameter of the second anode, wherein the electron source is positioned within the first cylindrical anode or the second cylindrical anode;
applying a first voltage from a first voltage source to the first cylindrical anode to deposit a first thickness of the source material in a first zone on the substrate; and
applying a second voltage to the second cylindrical anode to deposit a different, second thickness of the source material in a second zone on the substrate, wherein the second voltage is from one of the first voltage source or a separate second voltage source.

9. The method of claim 8 , wherein the substrate comprises a magnetic recording medium disc.

10. The method of claim 8 , wherein the source material is carbon.

11. The method of claim 10 , wherein a thickness of a carbon layer is greater in a concentric zone closer to the center of the substrate than in a concentric zone farther from the center of the substrate.

12. A method of manufacturing a magnetic recording medium comprising:
placing an ion source in front of a substrate, the ion source comprising a first cylindrical anode, a second cylindrical anode, and an electron source, the first cylindrical anode being concentric with and axially offset from the second cylindrical anode along a common central axis so as to protrude from the second cylindrical anode toward the substrate, wherein the electron source is positioned within the first cylindrical anode or the second cylindrical anode; and
using the ion source to deposit at least one carbon-containing layer on the substrate by applying a first voltage to the first cylindrical anode to deposit a first thickness of a carbon-containing layer in a first zone on a magnetic layer, and applying a second voltage to the second cylindrical anode to deposit a second thickness of the carbon-containing layer in a second zone on the magnetic layer.

13. The method of claim 12 , wherein the first anode is closer to the substrate than the second anode, the first anode has a first overall diameter, and the second anode has a second overall diameter greater than the first overall diameter.

14. The method of claim 13 , wherein the first voltage source input applies the first voltage from a first voltage source, and wherein the second voltage source input applies the second voltage from one of the first voltage source and a separate second voltage source.

15. The method of claim 13 , wherein the carbon-containing layer is deposited in two concentric zones.

16. The method of claim 15 , wherein a thickness of the carbon-containing layer is greater in a concentric zone closer to the center of the medium than in a concentric zone farther from the center of the medium.

17. The method of claim 13 , wherein the first zone is closer to the center of the substrate than the second zone, wherein the first voltage applied to the first cylindrical anode is greater than the second voltage applied to the second cylindrical anode such that the first thickness of the source material deposited in the first zone of the substrate is greater than the second thickness of the source material deposited in the second zone.

18. The method of claim 13 , wherein a first edge of the first cylindrical anode is offset from a corresponding edge of the second cylindrical anode such that the first edge of the first cylindrical anode is configured to be positioned closer to the substrate than the corresponding edge of the second cylindrical anode during use.

19. The method of claim 13 , wherein the substrate comprises a glass material.

20. The method of claim 13 , wherein the at least one magnetic layer comprises at least one oxide containing magnetic layer and at least one non-oxide containing magnetic layer.

Assignees

• Mcleod Paul Stephen
• Chour Kueir-Weei
• Seagate Technology Llc

Inventors

• Mcleod Paul Stephen
• Chour Kueir-Weei

Classifications

• H01J27/028 Primary

  Negative ion sources · CPC title

• G11B5/8408

  protecting the magnetic layer · CPC title