Optical design for line generation using microlens array

US8946594B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8946594-B2
Application numberUS-201213649028-A
CountryUS
Kind codeB2
Filing dateOct 10, 2012
Priority dateNov 4, 2011
Publication dateFeb 3, 2015
Grant dateFeb 3, 2015

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Abstract

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Embodiments of the invention provide an apparatus including a substrate support, a source of laser radiation emitting laser radiation along an optical path, and an illumination optics disposed along the optical path. The illumination optics includes a set of slow-axis and fast-axis lenses. The apparatus further includes a homogenizer disposed between of the illumination optics and the substrate support along the optical path. The homogenizer includes a first and a second micro-optic lenslet arrays of cylindrical lenses, wherein the second micro-optic lenslet array of cylindrical lenses has a relatively larger lenslet pitch than that of the first micro-optic lenslet array of cylindrical lenses, and lenslet axes of the first micro-optic lenslet array and lenslet axes of the second micro-optic lenslet array are oriented along an axis that is parallel to a fast axis of the source of laser radiation.

First claim

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The invention claimed is: 1. A thermal processing apparatus for processing a semiconductor substrate, comprising: a substrate support; a source of laser radiation for emitting laser radiation along an optical path; an illumination optics disposed along the optical path, comprising: a set of slow-axis lenses having at least a first cylindrical lens and a second cylindrical lens spaced apart from each other; and a set of fast-axis lenses having at least a first cylindrical le…

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What does patent US8946594B2 cover?
Embodiments of the invention provide an apparatus including a substrate support, a source of laser radiation emitting laser radiation along an optical path, and an illumination optics disposed along the optical path. The illumination optics includes a set of slow-axis and fast-axis lenses. The apparatus further includes a homogenizer disposed between of the illumination optics and the substrate…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification H10P34/42. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Feb 03 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).