Control over hydrogen fluoride levels in oxide etchant

US8945939B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8945939-B2
Application numberUS-201314082448-A
CountryUS
Kind codeB2
Filing dateNov 18, 2013
Priority dateApr 5, 2007
Publication dateFeb 3, 2015
Grant dateFeb 3, 2015

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

The invention is directed towards methods and compositions for identifying the amount of hydrofluoric acid in a buffered oxide etching composition. In buffered oxide etching compositions it is very difficult to measure the amount of hydrofluoric acid because it has varying equilibriums and it is toxic so it hard to handle and sample. When used to manufacture microchips however, incorrect amounts of hydrofluoric acid will ruin those chips. The invention utilizes a unique method of spectrographically measuring the hydrofluoric acid when in contact with added chromogenic agents to obtain exact measurements that are accurate, immediate, and safe.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of detecting and measuring the presence of a free HF in a BOE composition, the method comprising the steps of: collecting a representative sample of a BOE composition, adding a chromogenic agent to the composition, performing a spectrometric measurement of the composition, comparing the spectrometric measurement to pre-determined values to identify the quantity of HF in the BOE composition. 2. The method of claim 1 in w…

Assignees

Inventors

Classifications

Patent family

Related publications grouped by family.

External sources

Next steps

Free tools are coming soon. Tell us what you want to track and we'll notify you.

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US8945939B2 cover?
The invention is directed towards methods and compositions for identifying the amount of hydrofluoric acid in a buffered oxide etching composition. In buffered oxide etching compositions it is very difficult to measure the amount of hydrofluoric acid because it has varying equilibriums and it is toxic so it hard to handle and sample. When used to manufacture microchips however, incorrect amount…
Who is the assignee on this patent?
Nalco Co, Ecolab Usa Inc
What technology area does this patent fall under?
Primary CPC classification G01N21/272. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Feb 03 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).