Transfer chamber with vacuum extension for shutter disks

Patent metadata

Field	Value
Publication number	US-8945308-B2
Application number	US-201213589631-A
Country	US
Kind code	B2
Filing date	Aug 20, 2012
Priority date	May 9, 2007
Publication date	Feb 3, 2015
Grant date	Feb 3, 2015

Abstract

The present invention relates to a cluster tool for processing semiconductor substrates. One embodiment of the present invention provides a mainframe for a cluster tool comprising a transfer chamber having a substrate transferring robot disposed therein. The substrate transferring robot is configured to shuttle substrates among one or more processing chambers directly or indirectly connected to the transfer chamber. The mainframe further comprises a shutter disk shelf configured to store one or more shutter disks to be used by the one or more processing chambers, wherein the shutter disk shelf is accessible to the substrate transferring robot so that the substrate transferring robot can transfer the one or more shutter disks between the shutter disk shelf and the one or more processing chambers directly or indirectly connected to the transfer chamber.

First claim

What is claimed is:

1. A transfer chamber, comprising:
a main chamber body comprising a top, a bottom and a plurality of sidewalls defining a main volume, wherein each sidewall of the plurality of sidewalls has an opening formed therethrough;
an extension chamber body comprising a top, a bottom, and at least a first sidewall and a second sidewall defining an extension volume, wherein the extension chamber body is separately connected to the opening formed in one of the sidewalls…

Assignees

• Schaller Jason
• Applied Materials Inc

Inventors

• Schaller Jason

Classifications

• H10P72/3302

  Electricity · mapped topic

• H10P72/0464

  Electricity · mapped topic

• H10P72/0461

  Electricity · mapped topic

• H10P72/0456

  Electricity · mapped topic

• H01L21/67173

  Electricity · mapped topic