Surface treated aluminum nitride baffle
US-9222172-B2 · Dec 29, 2015 · US
Gas supply device
US8945306B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8945306-B2 |
| Application number | US-85789510-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 17, 2010 |
| Priority date | Feb 20, 2008 |
| Publication date | Feb 3, 2015 |
| Grant date | Feb 3, 2015 |
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Abstract
Official abstract text for this publication.
A gas supply device disposed opposite to a substrate mounted on a loading board in a processing container and supplying a process gas for processing the substrate comprises a top plate member having a recess formed to spread gradually toward the state in order to constitute a gas diffusion space at a position facing the substrate on the loading board, and a gas supply nozzle projecting into the recess from the top thereof and having a plurality of gas supply holes along the circumferential direction of the recess.
First claim
Opening claim text (preview).
What is claimed is: 1. A gas supply device for supplying a process gas to a substrate comprising: a loading board provided in a processing chamber configured to receive the substrate; a top plate member provided with a concave portion having a shape that end portion thereof is widening toward the loading board to form a gas diffusion space at a position that faces the substrate on the loading board; and a gas supply nozzle projected from a peak position to inside of the concav…
Assignees
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Classifications
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
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Frequently asked questions
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- What does patent US8945306B2 cover?
- A gas supply device disposed opposite to a substrate mounted on a loading board in a processing container and supplying a process gas for processing the substrate comprises a top plate member having a recess formed to spread gradually toward the state in order to constitute a gas diffusion space at a position facing the substrate on the loading board, and a gas supply nozzle projecting into the…
- Who is the assignee on this patent?
- Tsuda Einosuke, Tokyo Electron Ltd
- What technology area does this patent fall under?
- Primary CPC classification C23C16/45563. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Feb 03 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).