Method and apparatus for cleaning semiconductor wafer
US-2015332940-A1 · Nov 19, 2015 · US
Methods of removing particles from over semiconductor substrates
US8940102B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8940102-B2 |
| Application number | US-201213535322-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 27, 2012 |
| Priority date | Jan 8, 2009 |
| Publication date | Jan 27, 2015 |
| Grant date | Jan 27, 2015 |
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Abstract
Official abstract text for this publication.
Some embodiments include methods of removing particles from over surfaces of semiconductor substrates. Liquid may be flowed across the surfaces and the particles. While the liquid is flowing, electrophoresis and/or electroosmosis may be utilized to enhance transport of the particles from the surfaces and into the liquid. In some embodiments, temperature, pH and/or ionic strength within the liquid may be altered to assist in the removal of the particles from over the surfaces of the substrates.
First claim
Opening claim text (preview).
We claim: 1. A method of removing particles from over a surface of a semiconductor substrate, comprising: flowing a liquid across the surface of the substrate and the particles, the liquid having thickness over the substrate, a first region of the thickness being near the substrate and comprising particles, a second region of the thickness being further from the substrate than the first region and having more flow than the first region; while the liquid is flowing, imparting an…
Assignees
Inventors
Classifications
Operations & Transport · mapped topic
- H10P72/0416Primary
Electricity · mapped topic
Electricity · mapped topic
- H10P70/20Primary
Electricity · mapped topic
- H01L21/02041Primary
Electricity · mapped topic
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Frequently asked questions
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- What does patent US8940102B2 cover?
- Some embodiments include methods of removing particles from over surfaces of semiconductor substrates. Liquid may be flowed across the surfaces and the particles. While the liquid is flowing, electrophoresis and/or electroosmosis may be utilized to enhance transport of the particles from the surfaces and into the liquid. In some embodiments, temperature, pH and/or ionic strength within the liqu…
- Who is the assignee on this patent?
- Greeley Neil Joseph, Millward Dan, Huang Wayne, and 1 more
- What technology area does this patent fall under?
- Primary CPC classification H10P72/0416. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Jan 27 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).