Glass strengthening and patterning methods

US8938993B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-8938993-B2
Application numberUS-95720210-A
CountryUS
Kind codeB2
Filing dateNov 30, 2010
Priority dateNov 30, 2010
Publication dateJan 27, 2015
Grant dateJan 27, 2015

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

High intensity plasma-arc heat sources, such as a plasma-arc lamp, are used to irradiate glass, glass ceramics and/or ceramic materials to strengthen the glass. The same high intensity plasma-arc heat source may also be used to form a permanent pattern on the glass surface—the pattern being raised above the glass surface and integral with the glass (formed of the same material) by use of, for example, a screen-printed ink composition having been irradiated by the heat source.

First claim

Opening claim text (preview).

We claim: 1. A method comprising: strengthening an untreated glass sample by; providing a soda-lime silicate glass have a first surface comprising a tin side, a second surface comprising an air side and edges; providing a plasma-arc heat source capable of delivering a power density of at least 900 W/cm 2 in less than one second; unidirectionally translating the glass under the plasma-arc heat source at a speed of 8 mm/s; irradiating the first surface of the glass with the plasma-arc heat source at a power density of 900 W/cm 2 ; and quenching the glass following irradiation; thereby increasing an equibiaxial failure stress of the untreated glass by 25% or more and a uniaxial 4-point-bend failure stress of the untreated glass by 65% or more. 2. The method of claim 1 further comprising annealing the strengthened glass using the plasma-arc heat source for a second stage of heating. 3. A method comprising: patterning a glass sample by; providing a soda-lime silicate glass have a first surface, a second surface and edges; forming a first pattern of graphitic ink on the first surface of the glass using a screen printing method; providing a plasma-arc heat source capable of delivering a power density of at least 900 W/cm 2 in less than one second; unidirectionally translating the glass under the plasma-arc heat source at a speed of 8 mm/s; and irradiating the first surface of the glass with the plasma-arc heat source at a power density of 900 W/cm 2 and substantially simultaneously evolving the ink thereby forming a second pattern on the first surface of the glass wherein the second pattern comprises a glass material raised from the first surface of the glass, the second pattern corresponding to the first pattern. 4. The method of claim 3 wherein the graphitic ink comprises permanent black pen ink. 5. A method comprising: patterning a glass or glass ceramic sample by forming a first pattern of ink on a first surface of the glass; and irradiating the first surface of the glass with a plasma-arc heat source at a power density of 900 W/cm 2 thereby forming a second pattern on the first surface of the glass wherein the second pattern comprises a glass material raised from the first surface of the glass, the second pattern corresponding to the first pattern. 6. The method of claim 5 wherein the ink is controllably patterned onto the glass or glass ceramic sample. 7. The method of claim 5 further comprising unidirectionally translating the glass under the plasma-arc heat source at a speed of 8 mm/s. 8. The method of claim 5 wherein the glass comprises a silicate glass. 9. The method of claim 5 wherein the ink comprises black pen ink. 10. The method of claim 5 wherein the second pattern comprises a glass material having a different density value than that of the non-raised, unpatterned glass. 11. The method of claim 5 wherein the second pattern comprises a glass material raised from the first surface of the glass such that the pattern is visible to the naked eye. 12. The method of claim 5 wherein the second pattern comprises a glass material raised from the first surface of the glass at a height such that the pattern is capable of detection by touching the glass surface. 13. The method of claim 5 wherein the second pattern comprises a UPC code, a part number and/or a word. 14. The method of claim 5 wherein the second pattern comprises a raised glass material integral with glass material at the first surface.

Assignees

Inventors

Classifications

  • C03B27/012Primary

    by heat treatment, e.g. for crystallisation; Heat treatment of glass products before tempering by cooling (C03B27/008, C03B27/016 take precedence) · CPC title

  • by plasma or corona discharge · CPC title

  • in a discontinuous way · CPC title

  • Re-forming glass sheets · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US8938993B2 cover?
High intensity plasma-arc heat sources, such as a plasma-arc lamp, are used to irradiate glass, glass ceramics and/or ceramic materials to strengthen the glass. The same high intensity plasma-arc heat source may also be used to form a permanent pattern on the glass surface—the pattern being raised above the glass surface and integral with the glass (formed of the same material) by use of, for e…
Who is the assignee on this patent?
Harper David C, Wereszczak Andrew A, Duty Chad E, and 1 more
What technology area does this patent fall under?
Primary CPC classification C03B27/012. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Jan 27 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).