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Lithographic apparatus and device manufacturing method with radiation beam inspection using moveable reflecting device
US8937705B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8937705-B2 |
| Application number | US-43700909-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 7, 2009 |
| Priority date | Aug 31, 2005 |
| Publication date | Jan 20, 2015 |
| Grant date | Jan 20, 2015 |
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Abstract
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A lithographic apparatus can include the following devices: a patterning system, a projection system, and a radiation beam inspection device. The patterning system can be configured to provide a patterned radiation beam. The projection system can be configured to project the patterned radiation beam onto a target portion of a substrate. Further, the radiation beam inspection device can be configured to inspect at least a part of the patterned radiation beam. In a substrate exposure position, the projection system is configured to expose a pattern of radiation on the substrate using the patterned radiation beam and the radiation beam device is configured to move the reflecting device away from a light path of the patterned radiation beam. In a radiation beam inspection position, the radiation beam inspection device is configured to move the reflecting device into the light path of the patterned radiation beam.
First claim
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What is claimed is: 1. A lithographic apparatus, comprising: a patterning system configured to provide a patterned radiation beam; a projection system configured to project the patterned radiation beam onto a target portion of a substrate; a radiation beam inspection device comprising a sensor and a reflecting device and configured to inspect at least a part of the patterned radiation beam; a required pattern data store configured to store data corresponding to at least a pa…
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Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
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- What does patent US8937705B2 cover?
- A lithographic apparatus can include the following devices: a patterning system, a projection system, and a radiation beam inspection device. The patterning system can be configured to provide a patterned radiation beam. The projection system can be configured to project the patterned radiation beam onto a target portion of a substrate. Further, the radiation beam inspection device can be confi…
- Who is the assignee on this patent?
- Tel Wim Tjibbo, Van Der Laan Hans, Owen Cassandra May, and 4 more
- What technology area does this patent fall under?
- Primary CPC classification G03F7/70375. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Jan 20 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).