Systems And Methods Of Reduced Condensation Microscopy
US-2024345386-A1 · Oct 17, 2024 · US
Optical imaging with reduced immersion liquid evaporation effects
US8934079B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8934079-B2 |
| Application number | US-201113285729-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 31, 2011 |
| Priority date | May 4, 2009 |
| Publication date | Jan 13, 2015 |
| Grant date | Jan 13, 2015 |
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- Title
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Abstract
Official abstract text for this publication.
An optical arrangement for use in an optical imaging process includes an optical element, an immersion zone and a liquid repelling device. During the optical imaging process, the immersion zone is located adjacent to the optical element and is filled with an immersion liquid. The optical element has a first surface region and a second surface region. During the optical imaging process, the first surface region is wetted by the immersion liquid. At least temporarily during the optical imaging process, the liquid repelling device generates an electrical field in the region of the second surface. The electrical field being is adapted to cause a repellent force on parts of the immersion liquid which are responsive to the electrical field and inadvertently contact the second surface region. The repellent force has a direction to drive away the parts of the immersion liquid from the second surface region.
First claim
Opening claim text (preview).
What is claimed is: 1. An optical arrangement having an immersion zone, the optical arrangement comprising: an optical element having a first surface region and a second surface region; and a liquid repelling device comprising a liquid repelling component located at the second surface region of the optical element, the liquid repelling device being configured to generate an electric field in a region of liquid repelling component, wherein during use of the optical arrangement…
Assignees
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Classifications
- G02B27/0006Primary
Physics · mapped topic
- G03F7/70341Primary
Physics · mapped topic
Physics · mapped topic
- G03F7/70858Primary
Physics · mapped topic
Physics · mapped topic
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Frequently asked questions
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- What does patent US8934079B2 cover?
- An optical arrangement for use in an optical imaging process includes an optical element, an immersion zone and a liquid repelling device. During the optical imaging process, the immersion zone is located adjacent to the optical element and is filled with an immersion liquid. The optical element has a first surface region and a second surface region. During the optical imaging process, the firs…
- Who is the assignee on this patent?
- Six Stephan, Zeiss Carl Smt Gmbh
- What technology area does this patent fall under?
- Primary CPC classification G02B27/0006. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Jan 13 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).