Sputtering target of nonmagnetic-particle-dispersed ferromagnetic material

Patent metadata

Field	Value
Publication number	US-8932444-B2
Application number	US-201213613396-A
Country	US
Kind code	B2
Filing date	Sep 13, 2012
Priority date	Mar 28, 2008
Publication date	Jan 13, 2015
Grant date	Jan 13, 2015

Abstract

A sputtering target of nonmagnetic-particle-dispersed ferromagnetic material is provided having a phase (A) such that nonmagnetic particles are dispersed in a ferromagnetic material formed from a Co—Cr alloy containing 5 at % or more and 20 at % or less of Cr and Co as the remainder thereof, and schistose textures (B) with a short side of 30 to 100 μm and a long side of 50 to 300 μm formed from a Co—Cr alloy phase in the phase (A); wherein each of the foregoing nonmagnetic particles has such a shape and size that the particle is smaller than all hypothetical circles with a radius of 1 μm around an arbitrary point within the nonmagnetic particle, or a shape and size with at least two contact points or intersection points between the respective hypothetical circles and the interface of the ferromagnetic material and the nonmagnetic material.

First claim

The invention claimed is:

1. A sintered sputtering target comprising a ferromagnetic alloy dispersed with nonmagnetic oxide particles characterized in that:
the ferromagnetic alloy contains a composition consisting essentially of 5-20 at % Cr and Co as remainder;
the sintered sputtering target has a structure comprising a ferromagnetic alloy phase (A) in which the nonmagnetic oxide particles and particles of a Co—Cr alloy phase (B) are dispersed, the particles of the Co—Cr alloy phase (B) having a schistose shape with a short side length of 30 to 100 μm and a long side length of 50 to 300 μm; and
Cr is concentrated to 25 at % or more at a central part of each of the particles of the Co—Cr alloy phase (B) and is lower in concentration at a periphery of each of the particles of the Co—Cr alloy phase (B).

2. The sputtering target according to claim 1 , wherein, in any cross-section extending through the sputtering target, the Co—Cr alloy phase (B) has an area ratio of 4% or more and 30% or less relative to an overall area of the cross-section including the phase (A) in which the nonmagnetic oxide particles are dispersed.

3. The sputtering target of nonmagnetic-particle-dispersed ferromagnetic material according to claim 1 , wherein the nonmagnetic material is one or more types of oxides selected from Cr, Ta, Si, Ti, Zr, Al, Nb and B.

4. The sputtering target according to claim 1 , wherein the nonmagnetic oxide particles have a volume ratio of 10% or more and 30% or less relative to a total volume of the sputtering target.

5. The sputtering target of nonmagnetic-particle-dispersed ferromagnetic material according to claim 1 , wherein a relative density of the sputtering target is 97% or higher.

Assignees

• Sato Atsushi
• Jx Nippon Mining & Metals Corp

Inventors

• Sato Atsushi

Classifications

• C23C14/3414

  Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy · CPC title

• H01F41/183

  Sputtering targets therefor · CPC title

• C22C19/07

  based on cobalt · CPC title

• C22C49/14

  characterised by the fibres or filaments · CPC title

• C22C49/08

  Iron group metals · CPC title