Substrate Processing Method, Apparatus, and System
US-2024363405-A1 · Oct 31, 2024 · US
Systems and methods for measuring, monitoring and controlling ozone concentration
US8925481B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8925481-B2 |
| Application number | US-201113271449-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 12, 2011 |
| Priority date | Oct 12, 2011 |
| Publication date | Jan 6, 2015 |
| Grant date | Jan 6, 2015 |
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Abstract
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Systems and methods to determine ozone concentration in a gas mixture of ozone and oxygen, based on measurements of a total mass flow and a corresponding change in a chamber pressure accepting the mixture flow, can enable the measurements of ozone concentration at low pressure settings. The ozone concentration determination can be applied to a vacuum processing chamber, enabling precision semiconductor processing.
First claim
Opening claim text (preview).
What is claimed is: 1. A method to determine a concentration of a first gas in a gas mixture, the gas mixture comprising the first gas and a second gas, the method comprising: measuring a mass flow rate of a supply gas; converting the supply gas to the gas mixture, wherein a total mass flow rate of the gas mixture is equal to the mass flow rate of the supply gas; calculating a rate of change in pressure of a chamber accepting the gas mixture, the rate of change in pressure cor…
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Cross-Sectional Technologies · mapped topic
- C23C16/52Primary
Chemistry & Metallurgy · mapped topic
Physics · mapped topic
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
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Frequently asked questions
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- What does patent US8925481B2 cover?
- Systems and methods to determine ozone concentration in a gas mixture of ozone and oxygen, based on measurements of a total mass flow and a corresponding change in a chamber pressure accepting the mixture flow, can enable the measurements of ozone concentration at low pressure settings. The ozone concentration determination can be applied to a vacuum processing chamber, enabling precision semic…
- Who is the assignee on this patent?
- Shao Shouqian, Dedontney Jay, Wright Jason, and 1 more
- What technology area does this patent fall under?
- Primary CPC classification C23C16/52. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Jan 06 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).