High-power and high energy-density capacitor with scavenger

US2026081073A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2026081073-A1
Application numberUS-202519323487-A
CountryUS
Kind codeA1
Filing dateSep 9, 2025
Priority dateSep 18, 2024
Publication dateMar 19, 2026
Grant date

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Abstract

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An apparatus and method of constructing high power density capacitors. The apparatus and method may include scavenging materials between and around high-permittivity dielectric sections. Scavenging materials are added to the capacitor to remove electrons or holes that can lead to breakdown, without substantially reducing capacitance.

First claim

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1 . A capacitor apparatus comprising: at least one scavenger material, and at least one high-permittivity dielectric material, wherein the presence of the scavenger material increases the breakdown voltage of the capacitor by at least a factor of 5 without substantially reducing the capacitance. 2 . The apparatus of claim 1 , wherein the high-permittivity dielectric material has a permittivity of more than 100. 3 . The apparatus of claim 1 , wherein the high-permittivity dielectric material has a permittivity of more than 1,000. 4 . The apparatus of claim 1 , wherein the high-permittivity dielectric material has a permittivity of more than 100,000. 5 . The apparatus of claim 1 , wherein at least one of the scavenger materials is a scavenger of electrons. 6 . The apparatus of claim 1 , wherein at least one of the scavenger materials is a scavenger of holes. 7 . The apparatus of claim 1 , wherein at least one of the scavenger materials is initially a gas. 8 . The apparatus of claim 6 , wherein a pressure within a capacitor enclosure at the time the capacitor is formed is higher than one bar. 9 . The apparatus of claim 1 , wherein at least one of the scavenger materials is initially a liquid. 10 . A method for manufacturing capacitors comprising: combining scavenger material with high-permittivity dielectric material, and enclosing the combined scavenger material and high permittivity dielectric material, wherein the scavenger material increases the breakdown voltage of the capacitor by at least a factor of 5 without substantially reducing the capacitance. 11 . The method of claim 10 , wherein the high-permittivity dielectric material is exposed to the at least one of the scavenger materials prior to enclosure. 12 . The method of claim 10 , wherein the high-permittivity dielectric material is exposed to at least one of the scavenger materials at the time of enclosure. 13 . The method of claim 10 , wherein at least one of the high-permittivity dielectric materials has a permittivity of more than 100. 14 . The method of claim 10 , wherein at least one of the high-permittivity dielectric materials has a permittivity of more than 1,000. 15 . The method of claim 10 , wherein at least one of the high-permittivity dielectric materials has a permittivity of more than 100,000. 16 . The method of claim 10 , wherein at least one of the scavenger materials is a scavenger of electrons. 17 . The method of claim 10 , wherein at least one of the scavenger materials is a scavenger of holes. 18 . The method of claim 10 , wherein at least one of the scavenger materials is initially a liquid. 19 . The method of claim 10 , wherein at least one of the scavenger materials is initially a gas. 20 . The method of claim 10 , further comprising introducing pressure within the enclosed capacitor so that the pressure is higher than one bar.

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What does patent US2026081073A1 cover?
An apparatus and method of constructing high power density capacitors. The apparatus and method may include scavenging materials between and around high-permittivity dielectric sections. Scavenging materials are added to the capacitor to remove electrons or holes that can lead to breakdown, without substantially reducing capacitance.
Who is the assignee on this patent?
Weinberg Medical Physics Inc
What technology area does this patent fall under?
Primary CPC classification H01G4/06. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Mar 19 2026 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).