Semiconductor device and method for forming the same
US-2024395669-A1 · Nov 28, 2024 · US
US2026053052A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2026053052-A1 |
| Application number | US-202519059485-A |
| Country | US |
| Kind code | A1 |
| Filing date | Feb 21, 2025 |
| Priority date | Aug 14, 2024 |
| Publication date | Feb 19, 2026 |
| Grant date | — |
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A semiconductor package includes a base chip including a semiconductor body and a through-electrode structure penetrating through the semiconductor body and having a protrusion portion protruding upwardly of the semiconductor body, an insulating pattern on a side surface and an upper surface of the base chip, a chip stack on the base chip and the insulating pattern, and an encapsulant on the insulating pattern and covering at least a portion of the chip stack. The insulating pattern includes a first insulating portion on a side surface of the semiconductor body, and a second insulating portion on an upper surface of the semiconductor body and covering a side surface of the protrusion portion of the through-electrode structure. The insulating pattern includes an inorganic insulating material, and the encapsulant includes an organic insulating material.
Opening claim text (preview).
What is claimed is: 1 . A semiconductor package comprising: a base chip including, a semiconductor body, and a through-electrode structure penetrating through the semiconductor body, the through-electrode structure having a protrusion portion protruding upwardly of the semiconductor body; an insulating pattern on a side surface and an upper surface of the base chip; a chip stack on the base chip and the insulating pattern; and an encapsulant on the insulating pattern and covering at least a portion of the chip stack, wherein the insulating pattern includes, a first insulating portion on a side surface of the semiconductor body, and a second insulating portion on an upper surface of the semiconductor body, the second insulating portion covering a side surface of the protrusion portion of the through-electrode structure, the insulating pattern includes an inorganic insulating material, and the encapsulant includes an organic insulating material. 2 . The semiconductor package of claim 1 , wherein the insulating pattern has a structure in which the first insulating portion and the second insulating portion are integrally connected. 3 . The semiconductor package of claim 1 , further comprising: an upper pad on the through-electrode structure, wherein the second insulating portion vertically separates the upper pad and the semiconductor body. 4 . The semiconductor package of claim 1 , wherein the base chip includes a logic chip, and the chip stack includes at least one memory chip. 5 . The semiconductor package of claim 1 , wherein the insulating pattern includes silicon nitride (SiN), and the encapsulant includes an Epoxy Molding Compound (EMC). 6 . The semiconductor package of claim 1 , wherein, when viewed from above, at least a portion of an upper surface of the first insulating portion is at a lower level than an upper surface of the second insulating portion. 7 . The semiconductor package of claim 1 , wherein the encapsulant includes a first lower end in a first region, the first region vertically overlapping the semiconductor body, and a second lower end at a lower level than the first lower end in a second region, the second region not vertically overlapping the semiconductor body. 8 . The semiconductor package of claim 1 , further comprising: a lower pad on a lower surface of the base chip; and a lower protective layer below the lower surface of the base chip and a lower surface of the insulating pattern, the lower protective layer surrounding at least a portion of the lower pad. 9 . The semiconductor package of claim 8 , wherein the lower protective layer comprises silicon nitride (SiN). 10 . The semiconductor package of claim 1 , wherein the chip stack includes, a plurality of first semiconductor chips stacked on the base chip; and a second semiconductor chip stacked on the plurality of first semiconductor chips, wherein a thickness of the second semiconductor chip is greater than or equal to a thickness of each of the plurality of first semiconductor chips. 11 . The semiconductor package of claim 1 , wherein the base chip has a width greater than a width of the chip stack in a direction parallel to the upper surface of the base chip. 12 . The semiconductor package of claim 3 , further comprising: a bump structure on the upper pad; and an adhesive layer surrounding at least a portion of each of the upper pad and the bump structure. 13 . A semiconductor package comprising: a base chip including, a semiconductor body, and a through-electrode structure penetrating through the semiconductor body, the through-electrode structure having a protrusion portion protruding upwardly of the semiconductor body; an insulating pattern on a side surface and an upper surface of the base chip; a chip stack on the base chip and the insulating pattern; and an encapsulant on the insulating pattern and surrounding at least a portion of the chip stack, wherein the through-electrode structure includes, a via plug, a barrier layer surrounding a side surface of the via plug, and an insulating spacer layer surrounding a side surface of the barrier layer, and the insulating pattern and the encapsulant include different materials from each other. 14 . The semiconductor package of claim 13 , wherein the insulating pattern covers the upper surface of the semiconductor body and surrounds a side surface of the protrusion portion of the through-electrode structure. 15 . The semiconductor package of claim 13 , wherein an upper surface of the via plug is coplanar with an upper surface of the insulating pattern. 16 . The semiconductor package of claim 15 , wherein an upper surface of the insulating spacer layer is coplanar with the upper surface of the insulating pattern. 17 . The semiconductor package of claim 13 , further comprising: an upper pad on the through-electrode structure and the insulating pattern, wherein a lower surface of the upper pad is in contact with an upper surface of the through-electrode structure and an upper surface of the insulating pattern. 18 . The semiconductor package of claim 13 , further comprising: a buffer insulating layer between the insulating pattern and the semiconductor body. 19 . The semiconductor package of claim 18 , wherein the buffer insulating layer includes a first portion extending between a side surface of the protrusion portion of the through-electrode structure and the insulating pattern and a second portion extending between the insulating pattern and the semiconductor body. 20 . A semiconductor package comprising: a base chip; a chip stack on the base chip, the chip stack including a plurality of first semiconductor chips stacked in a vertical direction; an insulating pattern including a first insulating portion and a second insulating portion, the first insulating portion being on a side surface of the base chip, the second insulating portion connected to the first portion and extending between the base chip and the chip stack; and an encapsulant on the insulating pattern, the encapsulant covering at least a portion of a side surface of the chip stack and contacting the insulating pattern, the encapsulant including a material different from a material of the insulating pattern, wherein the base chip is spaced from the encapsulant by the insulating pattern, a side surface of the insulating pattern and a side surface of the encapsulant are vertically aligned, and at least a portion of the first insulating portion has an upper surface at a level lower than an upper surface of the second insulating portion.
Configurations of stacked chips · CPC title
characterised by the through-semiconductor vias [TSVs] in the stacked chips · CPC title
containing a filler · CPC title
comprising semiconductor materials · CPC title
forming a chip-scale package [CSP] · CPC title
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