High purity alkyl tin compounds and manufacturing methods thereof

Patent metadata

Field	Value
Publication number	US-2026008794-A1
Application number	US-202519328455-A
Country	US
Kind code	A1
Filing date	Sep 15, 2025
Priority date	Jun 2, 2022
Publication date	Jan 8, 2026
Grant date	—

Abstract

Monoalkyl tin triamide compounds having purity of at least about 99 mol % and the chemical formula RSn(NMe2)3 are described. R1 is selected from RA, RB, and RC; RA is a primary alkyl group having about 1 to 10 carbon atoms, RB is a secondary alkyl group having about 3 to 10 carbon atoms, and RC is a tertiary alkyl group having about 3 to 10 carbon atoms; each R2 is independently an alkyl group having about 1 to 10 carbon atoms; and a content of R1Sn(NR22)2(N(R2)CH2NR22) is less than about 1 mol %. Methods for synthesizing, purifying, and storing these compounds are also provided. The monoalkyl tin compounds may be used for the formation of high-resolution EUV lithography patterning precursors and are attractive due to their high purity and minimal concentration of dialkyl tin and other tin impurities.

First claim

1 . A composition comprising a monoalkyl tin triamide compound having formula (1) and having a purity of at least about 99 mol %:

wherein R 1 is R C ;
R C is a tertiary alkyl group having about 3 to 10 carbon atoms;
each R 2 is independently a methyl or ethyl group; and
wherein a content of R 1 Sn(NR 2 2 ) 2 (N(R 2 )CH 2 NR 2 2 ) is less than about 0.2 mol %.

2 . The composition according to claim 1 , wherein a content of dialkyl bis(dialkylamino) tin having formula (2) is less than about 1 mol %.

3 . The composition according to claim 1 , wherein a total content of tetrakis(dialkylamino)tin is less than about 1 mol %.

4 . The composition according to claim 1 , wherein a content of tetraalkyl tin is less than about 1 mol %.

5 . (canceled)

6 . The composition according to claim 1 , wherein an APHA is less than about 20.

7 . The composition according to claim 1 , wherein R 1 is a t-butyl group and each R 2 is independently a methyl or ethyl group

8 . The composition according to claim 7 , wherein the content of dit-butyl bis(dimethylamino) tin is less than about 1 mol %.

9 . The composition monoalkyl tin triamide compound according to claim 7 , wherein a total content of tetrakis(dimethylamino)tin is less than about 1 mol %.

10 . The composition according to claim 1 , wherein the content of R 1 Sn(NR 2 2 ) 2 (N(R 2 )CH 2 NR 2 2 ) is less than about 0.05 mol %.

11 . A method of synthesizing a monoalkyl tin triamide compound having formula (1a) and having a purity of at least about 85 mol %:

wherein R 1 is selected from R A and R B ;
R A is a primary alkyl group having about 1 to 10 carbon atoms and R B is a secondary alkyl group having about 3 to 10 carbon atoms; and
each R 2 is independently an alkyl group having about 1 to 10 carbon atoms; the method comprising:
(a) lithiating a solution comprising a dimethylamine and a first solvent to produce a lithium dimethylamide solution having a concentration of up to about 10 wt %;
(b) adding a solution comprising an alkyl trichlorotin and a second solvent; wherein the amount of lithium dimethylamide in the solution is at least about 3.09 equivalents relative to the amount of alkyl trichlorotin;
(c) removing the LiCl salt product by filtration; and
(d) removing the first solvent and the second solvent under vacuum to produce a crude product containing the monoalkyl tin triamide having formula (1a);
wherein steps (a) to (d) are performed substantially without light exposure.

12 . The method according to claim 11 , wherein the compound having formula (1a) has a purity of at least about 99 mol %.

13 . The method according to claim 11 , wherein the compound having formula (1a) contains less than about 1 mol % R 1 Sn(NR 2 2 ) 2 (N(R 2 )CH 2 NR 2 2 ).

14 . The method according to claim 13 , wherein the compound having formula (1a) contains less than about 0.05 mol % R 1 Sn(NR 2 2 ) 2 (N(R 2 )CH 2 NR 2 2 ).

15 . The method according to claim 11 , wherein step (b) is performed at about −78° C. to about 40° C.

16 . The method according to claim 15 , wherein step (b) is performed at about 0° C. to about 10° C.

17 . The method according to claim 11 , wherein the first solvent and the second solvent are each independently selected from the group consisting of a hydrocarbon solvent, an aromatic solvent, and an ether solvent.

18 . (canceled)

19 . The method according to claim 11 , wherein steps (a) and (b) are performed in a stainless steel vessel.

20 . The method according to claim 11 , further comprising distilling the compound having formula (1a).

21 . The method according to claim 20 , wherein the distillation comprises distilling the crude product having formula (1a) at about 1 torr, discarding any distillate before the boiling point of the monoalkyl triamide having formula (1a), and collecting the distillate obtained at the boiling point of the monoalkyltin triamide having formula (1a) to yield a product containing at least about 99 mol % monoalkyl tin triamide having formula (1a).

22 . The method according to claim 20 , comprising performing a fractional distillation using an operating pressure of about 0.1 to about 50 torr and a pot temperature of about 50 to about 120° C., wherein the purified monoalkyl tin triamide compound having formula (1a) contains less than about 0.1 mol % of a dialkyl bis(dialkylamino)tin compound having formula (2).

23 . The method according to claim 20 , comprising performing the distillation substantially without light exposure.

24 . The method according to claim 20 , comprising performing the distillation using a condenser temperature within about 1 to about 10° C. of the dew point of the monoalkyl tin triamide compound having formula (1a) at the operating pressure and at a reflux ratio of about 10 to about 100.

25 - 38 . (canceled)

Assignees

• Gelest Inc
• Mitsubishi Chem Corp

Inventors

• Yang Li
• Hioki Yuta

Classifications

• C07F7/2296

  Purification, stabilisation, isolation · CPC title

• C07F7/2284 Primary

  Compounds with one or more Sn-N linkages · CPC title