Abnormality detection apparatus and abnormality detection method

Patent metadata

Field	Value
Publication number	US-2025364334-A1
Application number	US-202318691713-A
Country	US
Kind code	A1
Filing date	Feb 21, 2023
Priority date	Feb 21, 2023
Publication date	Nov 27, 2025
Grant date	—

Abstract

An abnormality detection apparatus including: a processing shape prediction unit configured to predict, using a processing result prediction model in which a control parameter value of the processing apparatus and an observation parameter value obtained by observing a phenomenon occurring in the processing apparatus during the processing are set as an independent variable and an evaluation value of the processing by the processing apparatus is set as a dependent variable, the evaluation value of the processing by the processing apparatus; and a first abnormality detection unit configured to detect, based on a difference between an evaluation value of determination target processing and a prediction evaluation value of the determination target processing predicted by inputting a control parameter value used in the determination target processing and an observation parameter value observed in the determination target processing to the processing result prediction model, an abnormality in the processing result.

First claim

1 . An abnormality detection apparatus for determining whether there is an abnormality in a processing result obtained by processing a sample by a processing apparatus, the abnormality detection apparatus comprising:
a processing shape prediction unit configured to predict, using a processing result prediction model in which a control parameter value of the processing apparatus and an observation parameter value obtained by observing a phenomenon occurring in the processing apparatus during the processing by the processing apparatus are set as an independent variable and an evaluation value of the processing by the processing apparatus is set as a dependent variable, the evaluation value of the processing by the processing apparatus; and a first abnormality detection unit configured to detect, based on a difference between an evaluation value of determination target processing and a prediction evaluation value of the determination target processing predicted by inputting a control parameter value used in the determination target processing and an observation parameter value observed in the determination target processing to the processing result prediction model, an abnormality in the processing result of the processing apparatus.

2 . The abnormality detection apparatus according to claim 1 , further comprising:
a prediction explanation unit configured to calculate a degree of contribution of each independent variable to the prediction evaluation value for the determination target processing; and a second abnormality detection unit configured to detect, based on a degree-of-contribution pattern of the independent variable in the determination target processing calculated by the prediction explanation unit, the abnormality in the processing result of the processing apparatus.

3 . The abnormality detection apparatus according to claim 2 , further comprising:
integration determination unit configured to integrate an abnormality detection result of the first abnormality detection unit and an abnormality detection result of the second abnormality detection unit to determine whether there is an abnormality in a result of the determination target processing.

4 . The abnormality detection apparatus according to claim 3 , wherein
the processing result prediction model is trained based on a plurality of results of an experiment obtained by processing the sample by the processing apparatus, the abnormality detection apparatus further comprises a storage apparatus configured to store a control parameter value used in processing in the experiment, an observation parameter value observed in the processing in the experiment, and an evaluation value of the processing in the experiment, which are used as training data of the processing result prediction model, and the first abnormality detection unit detects the abnormality in the processing result of the processing apparatus by comparing a difference between the evaluation value and the prediction evaluation value of the determination target processing with a difference between the evaluation value of the processing in the experiment and a prediction evaluation value of the processing in the experiment predicted by inputting the control parameter value used in the processing in the experiment and the observation parameter value observed in the processing in the experiment to the processing result prediction model.

5 . The abnormality detection apparatus according to claim 4 , wherein
the prediction explanation unit calculates a degree of contribution of each independent variable to the prediction evaluation value for the processing in the experiment, and stores, in the storage apparatus, a degree-of-contribution pattern of the independent variable in the processing in the experiment calculated by the prediction explanation unit, and the second abnormality detection unit detects the abnormality in the processing result of the processing apparatus by comparing the degree-of-contribution pattern of the independent variable in the determination target processing with the degree-of-contribution pattern of the independent variable in the processing in the experiment.

6 . The abnormality detection apparatus according to claim 5 , wherein
the processing shape prediction unit trains the processing result prediction model using the training data stored in the storage apparatus.

7 . The abnormality detection apparatus according to claim 6 , wherein
when the integration determination unit determines that there is no abnormality in the result of the determination target processing, the processing shape prediction unit trains the processing result prediction model using the evaluation value of the determination target processing, the control parameter value used in the determination target processing, and the observation parameter value observed in the determination target processing, and the integration determination unit determines that there is an abnormality in the result of the determination target processing when both the first abnormality detection unit and the second abnormality detection unit detect an abnormality, and determines that there is no abnormality in the result of the determination target processing when at least one of the first abnormality detection unit and the second abnormality detection unit does not detect the abnormality.

8 . The abnormality detection apparatus according to claim 7 , further comprising:
a knowledge linkage unit configured to, when the integration determination unit determines that there is an abnormality in the result of the determination target processing, match an observation parameter value whose abnormality is detected by the second abnormality detection unit with knowledge data and to extract related knowledge.

9 . The abnormality detection apparatus according to claim 8 , wherein
the abnormality detection results of the first abnormality detection unit and the second abnormality detection unit, a result of the determination by the integration determination unit, and the knowledge extracted by the knowledge linkage unit are displayed on a display apparatus.

10 . The abnormality detection apparatus according to claim 1 , wherein
the processing apparatus is a plasma processing apparatus configured to etch the sample, and a light emission intensity of plasma in a predetermined band obtained by observing light emission of the plasma generated in the processing apparatus during processing by the processing apparatus is set as the observation parameter value, and a processing dimension of the sample by the etching is set as the evaluation value of the processing by the processing apparatus.

11 . An abnormality detection method using an abnormality detection apparatus for determining whether there is an abnormality in a processing result obtained by processing a sample by a processing apparatus, the abnormality detection apparatus including a processing shape prediction unit and a first abnormality detection unit, the method comprising:
causing the processing shape prediction unit to predict, using a processing result prediction model in which a control parameter value of the processing apparatus and an observation parameter value obtained by observing a phenomenon occurring in the processing apparatus during the processing by the processing apparatus are set as an independent variable and an evaluation value of the processing by the processing apparatus is set as a dependent variable, the evaluation value of the processing by the processing apparatus; and causing the first abnormality detection unit to detect, based on a difference between an evaluation value of determination target processing and a prediction eva

Assignees

• Hitachi High Tech Corp

Inventors

• Mori Yasuhide
• Sharma Prashant Kumar
• Hamamoto Masaki
• Ohmori Takeshi

Classifications

• H10P50/00 Primary

  Etching of wafers, substrates or parts of devices · CPC title

• H10P74/23 Primary

  characterised by multiple measurements, corrections, marking or sorting processes · CPC title

• H10P74/00

  Testing or measuring during manufacture or treatment of wafers, substrates or devices · CPC title

• H10P50/242

  of Group IV materials · CPC title

• H10P95/00

  Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass · CPC title