Resist composition, resist pattern formation method, and compound

Patent metadata

Field	Value
Publication number	US-2025278021-A1
Application number	US-202318862315-A
Country	US
Kind code	A1
Filing date	May 9, 2023
Priority date	May 17, 2022
Publication date	Sep 4, 2025
Grant date	—

Abstract

A resist composition including a resin component having a constitutional unit derived from a compound represented by General Formula (a0-1). In the formulas, R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms; Rpg represents an acid dissociable group represented by General Formula (a0-pg); A represents a cyclic alkene having only one carbon-carbon unsaturated bond in a ring skeleton; Ra 01 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms; m1 represents an integer of 0 to 20; m2 represents an integer of 1 to 20; and * represents a bonding site

First claim

What is claimed is:

1 . A resist composition which generates an acid upon light exposure and whose solubility in a developing solution is changed by an action of the acid, the resist composition comprising:
a resin component (A1) whose solubility in a developing solution is changed by the action of the acid, wherein the resin component (A1) has a constitutional unit (a0) derived from a compound represented by General Formula (a0-1),

wherein R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, and Rpg represents an acid dissociable group represented by General Formula (a0-pg),

wherein A represents a cyclic alkene having only one carbon-carbon unsaturated bond in a ring skeleton, Ra 01 represents a monovalent hydrocarbon group having 1 to 20 carbon atoms, m1 represents an integer of 0 to 20, m2 represents an integer of 1 to 20, where m1+m2≤(a total number of carbon atoms constituting the ring skeleton of the cyclic alkene as A-1) is satisfied, a plurality of Ra 01 's may be the same as or different from each other in a case where m1 represents an integer of 2 or greater, and * represents a bonding site.

2 . The resist composition according to claim 1 ,
wherein the constitutional unit (a0) is a constitutional unit derived from a compound represented by General Formula (a0-t1),

wherein R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, A represents a cyclic alkene having only one carbon-carbon unsaturated bond in a ring skeleton, C t represents a tertiary carbon atom, Ra t1 represents a linear or branched alkyl group having 1 to 12 carbon atoms, Ra 01 represents a monovalent hydrocarbon group having 1 to 20 carbon atoms, m1 represents an integer of 0 to 20, m2 represents an integer of 1 to 20, where m1+m2≤(the total number of carbon atoms constituting the ring skeleton of the cyclic alkene as A-1) is satisfied, and a plurality of Ra 01 's may be the same as or different from each other in a case where m1 represents an integer of 2 or greater.

3 . The resist composition according to claim 1 ,
wherein the constitutional unit (a0) is a constitutional unit derived from a compound represented by General Formula (a0-s1),

wherein R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, A represents a cyclic alkene having only one carbon-carbon unsaturated bond in a ring skeleton, C s represents a secondary carbon atom, C 1 and C 2 each independently represent a carbon atom constituting the carbon-carbon unsaturated bond of the cyclic alkene as A, Ra s1 and Ra s2 each independently represent a hydrogen atom, an iodine atom, or a monovalent hydrocarbon group having 1 to 20 carbon atoms, Ra 01 represents a monovalent hydrocarbon group having 1 to 20 carbon atoms, m21 represents an integer of 0 to 20, m22 represents an integer of 0 to 20, where m21+m22≤(the total number of carbon atoms constituting the ring skeleton of the cyclic alkene as A-3) is satisfied, at least one of Ra s1 or Ra s2 represents an iodine atom in a case where m22 represents 0, and a plurality of Ra 01 's may be the same as or different from each other in a case where m21 represents an integer of 2 or greater.

4 . The resist composition according to claim 1 ,
wherein, in General Formula (a0-1), an iodine atom is bonded to at least one of carbon atoms constituting the carbon-carbon unsaturated bond in the ring skeleton of the cyclic alkene as A.

5 . The resist composition according to claim 2 ,
wherein the constitutional unit (a0) is a constitutional unit derived from a compound represented by General Formula (a0-t1-1),

wherein R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, A represents a cyclic alkene having only one carbon-carbon unsaturated bond in a ring skeleton, C t represents a tertiary carbon atom, C 1 and C 2 each independently represent a carbon atom constituting the carbon-carbon unsaturated bond of the cyclic alkene as A, Ra t1 represents a linear or branched alkyl group having 1 to 12 carbon atoms, Ra t2 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms, Ra 01 represents a monovalent hydrocarbon group having 1 to 20 carbon atoms, m11 represents an integer of 0 to 20, m12 represents an integer of 0 to 19, where m11+m12≤(the total number of carbon atoms constituting the ring skeleton of the cyclic alkene as A-3) is satisfied, and a plurality of Ra 01 's may be the same as or different from each other in a case where m11 represents an integer of 2 or greater.

6 . The resist composition according to claim 3 ,
wherein the constitutional unit (a0) is a constitutional unit derived from a compound represented by General Formula (a0-s1-1),

wherein R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, A represents a cyclic alkene having only one carbon-carbon unsaturated bond in a ring skeleton, C s represents a secondary carbon atom, C 1 and C 2 each independently represent a carbon atom constituting the carbon-carbon unsaturated bond of the cyclic alkene as A, Ra s11 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms, Ra 01 represents a monovalent hydrocarbon group having 1 to 20 carbon atoms, m21 represents an integer of 0 to 20, m22 represents an integer of 0 to 19, where m21+m22≤(the total number of carbon atoms constituting the ring skeleton of the cyclic alkene as A-3) is satisfied, and a plurality of Ra 01 's may be the same as or different from each other in a case where m21 represents an integer of 2 or greater.

7 . The resist composition according to claim 3 ,
wherein the constitutional unit (a0) is a constitutional unit derived from a compound represented by General Formula (a0-s1-2),

wherein R represents a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, A represents a cyclic alkene having only one carbon-carbon unsaturated bond in a ring skeleton, C s represents a secondary carbon atom, C 1 and C 2 each independently represent a carbon atom constituting the carbon-carbon unsaturated bond of the cyclic alkene as A, Ra s21 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms, Ra 01 represents a monovalent hydrocarbon group having 1 to 20 carbon atoms, m21 represents an integer of 0 to 20, m22 represents an integer of 0 to 19, where m21+m22≤(the total number of carbon atoms constituting the ring skeleton of the cyclic alkene as A-3) is satisfied, and a plurality of Ra 01 's may be the same as or different from each other in a case where m21 represents an integer of 2 or greater.

8 . The resist composition according to

Assignees

• Tokyo Ohka Kogyo Co Ltd

Inventors

• Uehara Takuya
• Kato Hiroki

Classifications

• C08F2/48

  by ultraviolet or visible light · CPC title

• C08F2/50

  with sensitising agents · CPC title

• C08F212/24

  Phenols or alcohols · CPC title

• G03F7/0392

  the macromolecular compound being present in a chemically amplified positive photoresist composition · CPC title

• G03F7/325

  Non-aqueous compositions · CPC title