Co-sputtering rare earth rotating target material, and preparation method, and application method therefor

Patent metadata

Field	Value
Publication number	US-2025191818-A1
Application number	US-202519057066-A
Country	US
Kind code	A1
Filing date	Feb 19, 2025
Priority date	Sep 7, 2022
Publication date	Jun 12, 2025
Grant date	—

Abstract

Disclosed are a co-sputtering rare earth rotating target material, and a preparation method and an application method therefor. The co-sputtering rare earth rotating target material includes two sections of end target tubes arranged at an axial end of the target material, and a plurality of sections of rare earth target tubes and a plurality of sections of co-sputtering target tubes which are arranged between the two sections of end target tubes and with a target material along an axial middle region, wherein the plurality of sections of rare earth target tubes are spaced apart from the plurality of sections of co-sputtering target tubes, and the target tubes are mutually assembled via welding; and the co-sputtering target tubes are selected from at least one of aluminum, copper, nickel, iron and praseodymium target tubes, and the end target tubes are non-rare earth target tubes or rare earth target tubes.

First claim

What is claimed is:

1 . A co-sputtering rare earth rotating target material, comprising a back tube and a plurality of sections of target tubes welded to the outside of the back tube;
wherein the back tube and the plurality of sections of target tubes welded to the outside of the back tube are concentric cylindrical structures; the plurality of sections of target tubes welded to the outside of the back tube comprise two sections of end target tubes arranged at an axial end of the target material, and a plurality of sections of rare earth target tubes and a plurality of sections of co-sputtering target tubes which are arranged between the two sections of end target tubes and with a target material along an axial middle region; the plurality of sections of rare earth target tubes are spaced apart from the plurality of sections of co-sputtering target tubes, and the target tubes are mutually assembled via welding; and the co-sputtering target tubes are selected from at least one of aluminum, copper, nickel, iron, and praseodymium target tubes, and the end target tubes are non-rare earth target tubes or rare earth target tubes.

2 . The rare earth rotating target material according to claim 1 , wherein the rare earth target tube comprises a rotating target tube selected from terbium, dysprosium, holmium, and gadolinium.

3 . The rare earth rotating target material according to claim 1 , wherein a length of the end target tube is 20-35 mm, lengths of both the rare earth target tube and the co-sputtering target tube are less than or equal to 300 mm, and a length ratio of the rare earth target tube and the co-sputtering target tube arranged in the middle region is 1.3-20.

4 . The rare earth rotating target material according to claim 1 , wherein a clearance d is left between the mutually assembled target tubes, and a value of the clearance d is 0.1 mm≤d≤ 0.5 mm.

5 . The rare earth rotating target material according to claim 1 , wherein the co-sputtering target tube is an aluminum target tube or a copper target tube;
when the co-sputtering target tube is an aluminum target tube, the length ratio of the rare earth target tube to the co-sputtering target tube arranged in the middle region is 1.8-3.0; when the co-sputtering target tube is a copper target tube, the length ratio of the rare earth target tube to the co-sputtering target tube arranged in the middle region is 6.0-10.0.

6 . The rare earth rotating target material according to claim 1 , wherein outer diameters of two rare earth target tubes adjacent to the end target tubes at both ends of the target material are reduced from an outer diameter OD2 to an outer diameter OD3 from a direction of both ends of the target material to a direction of the middle region, and the outer diameter OD2 is equal to the outer diameter OD1 of the end target tube.

7 . A preparation method for the rare earth rotating target material according to claim 1 , comprising the following steps:
assembling two sections of end target tubes, a plurality of sections of rare earth target tubes, and a plurality of sections of co-sputtering target tubes, wherein the two sections of end target tubes are arranged at two ends of the target material along the axial direction; the plurality of sections of rare earth target tubes are spaced apart from the plurality of sections of co-sputtering target tubes in the middle region of the target material along the axial direction; and the plurality of sections of rare earth target tubes are spaced apart from the plurality of sections of co-sputtering target tubes; assembling each target tube and back tube together by welding; and welding the assembled target tubes and the back tube.

8 . A method for co-sputtering using the rare earth rotating target material according to claim 1 , comprising the following steps:
arranging the rare earth rotating target material and a magnet on a coating production line; performing vacuum pumping, pre-sputtering, and then sputtering; and subjecting the magnet to thermal and temper treatments.

9 . The method according to claim 8 , wherein the thermal treatment temperature is 600-950° C.; and the thermal treatment time is 5-10 hours.

10 . The method according to claim 8 , wherein the temper treatment temperature is 400-600° C. and the temper treatment time is 2-6 hours.

Assignees

• Grirem Advanced Mat Co Ltd
• Grirem Hi Tech Co Ltd

Inventors

• Wang Zhiqiang
• Chen Dehong
• Zhong Jiamin
• Li Zongan
• Yang Hongbo
• Cheng Jun
• Pang Siming
• Yang Bingzheng
• Wang Shuang
• Zhang Yanling
• Zhang Xiaoqiang
• Liu Dezhong
• Han Liguo

Classifications

• H01J37/3417

  Arrangements · CPC title

• H01J37/3429

  Plural materials · CPC title

• G11B5/851

  Coating a support with a magnetic layer by sputtering · CPC title

• H01J37/342

  Hollow targets · CPC title

• H01J37/3491

  Manufacturing of targets · CPC title