Radiation conduit

Patent metadata

Field	Value
Publication number	US-2025155820-A1
Application number	US-202519020768-A
Country	US
Kind code	A1
Filing date	Jan 14, 2025
Priority date	Sep 30, 2019
Publication date	May 15, 2025
Grant date	—

Abstract

A radiation source for an EUV lithography apparatus is disclosed. The radiation source comprises a chamber comprising a plasma formation region, a radiation collector arranged in the chamber and configured to collect radiation emitted at the plasma formation region and to direct the collected radiation towards an intermediate focus region, and a radiation conduit disposed between the radiation collector and the intermediate focus region. The radiation conduit comprises at least one outlet on an inner surface of a wall of the radiation conduit for directing a protective gas flow, and at least one guide portion extending from the inner surface of the wall of the radiation conduit and configured to redirect the protective gas flow. Also disclosed is a method of reducing debris and/or vapor deposition in the radiation conduit by providing a protective gas flow to the at least one outlet of the radiation conduit.

First claim

1 . A radiation source for an EUV lithography apparatus, the radiation source comprising:
a chamber comprising a plasma formation region; a radiation collector configured in the chamber and configured to collect radiation emitted at the plasma formation region and to direct the collected radiation towards an intermediate focus region; and a radiation conduit disposed between the radiation collector and the intermediate focus region, wherein the radiation conduit comprises at least one outlet on an inner surface of a wall of the radiation conduit for directing a protective gas flow, and at least one guide portion extending from the inner surface of the wall of the radiation conduit and configured to redirect the protective gas flow.

2 . The radiation source of claim 1 , wherein the at least one guide portion is configured to redirect the protective gas flow from a first direction substantially away from the inner surface of the wall of the radiation conduit to a second direction substantially along the inner surface of the wall of the radiation conduit.

3 . The radiation source of claim 2 , wherein the second direction is substantially towards the plasma formation region.

4 . The radiation source of claim 1 , wherein the at least one guide portion is configured to redirect the protective gas flow to form a protective gas curtain flow directed substantially along the inner surface of the wall of the radiation conduit.

5 . The radiation source of claim 4 , wherein one guide portion is configured to redirect the protective gas flow substantially towards the plasma formation region.

6 . The radiation source of claim 1 , wherein the inner surface of the wall tapers inwardly from an entrance aperture distal to the intermediate focus region to an exit aperture proximal to the intermediate focus region.

7 . The radiation source of claim 1 , wherein the radiation conduit is disposed proximal to the intermediate focus region.

8 . The radiation source of claim 1 , wherein the at least one guide portion and the radiation conduit are formed as a monolithic structure.

9 . The radiation source of claim 1 , wherein the at least one guide portion extends circumferentially and/or continuously around the inner surface of the wall of the radiation conduit.

10 . The radiation source of claim 1 , wherein a surface of the at least one guide portion forms a channel between the inner surface of the wall of the radiation conduit and the at least one guide portion.

11 . The radiation source of claim 10 , wherein the at least one outlet on the inner surface of the wall of the radiation conduit is disposed in the channel.

12 . The radiation source of claim 10 , wherein the channel is a ring-shaped channel wherein the protective gas flow can accumulate before flowing along the inner surface of the wall of the radiation conduit in a direction towards the plasma formation region.

13 . The radiation source of claim 1 , wherein the inner surface of the wall of the radiation conduit is defined by at least one of: a smooth surface; ridged surfaces; a stepped surface; undulating surfaces; and/or vane surfaces.

14 . The radiation source of claim 1 , wherein the at least one guide portion forms a substantially ring-shaped structure.

15 . The radiation source of claim 14 , wherein the substantially ring-shaped structure follows a circular trajectory along the inner surface of the wall around a central axis.

16 . The radiation source of claim 1 , wherein the channel is angled relative to the inner surface of the wall such that the protective gas flow is redirected away from a ridge, undulation, or vane of the radiation conduit.

17 . A radiation conduit for the radiation source of claim 1 , the radiation conduit comprising:
at least one outlet on an inner surface of a wall of the radiation conduit for directing a protective gas flow; and at least one guide portion extending from the inner surface of the wall of the radiation conduit and configured to redirect the protective gas flow.

18 . A method of reducing debris and/or vapor deposition in the radiation conduit of claim 17 , the method comprising providing a protective gas flow to the at least one outlet of the radiation conduit, such that the protective gas flow is redirected by the at least one guide portion.

19 . A lithographic system comprising a radiation source and a lithographic apparatus or a lithographic tool configured to receive radiation generated in the radiation source, wherein the radiation source comprises:
a chamber comprising a plasma formation region; a radiation collector configured in the chamber and configured to collect radiation emitted at the plasma formation region and to direct the collected radiation towards an intermediate focus region; and a radiation conduit disposed between the radiation collector and the intermediate focus region, wherein the radiation conduit comprises at least one outlet on an inner surface of a wall of the radiation conduit for directing a protective gas flow, and at least one guide portion extending from the inner surface of the wall of the radiation conduit and configured to redirect the protective gas flow.

Assignees

• Asml Netherlands Bv

Inventors

• Heijmans Remco Johannes Elisa
• Van Der Straaten Gerrit
• Vanderhallen Ivo
• Westerlaken Jan Steven Christiaan

Classifications

• H05G2/003

  the plasma being generated from a material in a liquid or gas state · CPC title

• H05G2/009

  Auxiliary arrangements not involved in the plasma generation · CPC title

• G03F7/70166

  Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides · CPC title

• G03F7/70933

  Purge, e.g. exchanging fluid or gas to remove pollutants · CPC title

• G03F7/70916

  Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps · CPC title