Resin composition

US2025084205A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2025084205-A1
Application numberUS-202418789287-A
CountryUS
Kind codeA1
Filing dateJul 30, 2024
Priority dateAug 8, 2023
Publication dateMar 13, 2025
Grant date

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

Provided is a resin composition containing: (A) a first cyclic imide compound of the following formula (1): wherein A independently represents a tetravalent organic group having a cyclic structure, Q independently represents an alicyclic hydrocarbon group of the formula (2): wherein R 1 , R 2 , R 3 , and R 4 independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and x1 and x2 are each 0 to 4, wherein B independently represents a divalent hydrocarbon group (excluding the group represented by the formula (2)), wherein X represents a hydrogen atom or a methyl group, and wherein n is 1 to 200; (B) a second cyclic imide compound of the formula (3): wherein A, B, and X are defined as above in the formula (1), and s is 0 to 200; (C) an epoxy compound; and (D) a curing catalyst.

First claim

Opening claim text (preview).

What is claimed is: 1 . A resin composition comprising the following components (A) to (D): (A) a first cyclic imide compound represented by: wherein A independently represents a tetravalent organic group having a cyclic structure, Q independently represents an alicyclic hydrocarbon group represented by: wherein R 1 , R 2 , R 3 , and R 4 independently represent a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, and x1 and x2 are each 0 to 4, wherein B independently represents any one of divalent hydrocarbon groups represented by the following formulae: wherein bonds that are yet unbonded to substituent groups are to be bonded to nitrogen atoms forming cyclic imide structures in the formula (1), each R 1 independently represents a hydrogen atom or a linear or branched alkyl group having 1 to 20 carbon atoms, p 1 and p 2 are each a number of 5 or more and may be identical to or different from each other, and p 3 and p 4 are each a number of 0 or more and may be identical to or different from each other, wherein X represents a hydrogen atom or a methyl group, and wherein n is 1 to 200, m is 0 to 200, provided that when m is 1 or more, n:m=1:1 to 4:1, and repeating units identified by n and m may be present in any order; (B) a second cyclic imide compound represented by: wherein A independently represents a tetravalent organic group having a cyclic structure, wherein B independently represents any one of divalent hydrocarbon groups represented by the following formulae: wherein bonds that are yet unbonded to substituent groups are to be bonded to nitrogen atoms forming cyclic imide structures in the formula (3), each R 1 independently represents a hydrogen atom or a linear or branched alkyl group having 1 to 20 carbon atoms, p 1 and p 2 are each a number of 5 or more and may be identical to or different from each other, and p 3 and p 4 are each a number of 0 or more and may be identical to or different from each other, wherein X represents a hydrogen atom or a methyl group, and wherein s is 0 to 200; (C) an epoxy compound; and (D) a curing catalyst, wherein the first cyclic imide compound (A) is contained in an amount of 60 to 90 parts by mass and the second cyclic imide compound (B) is contained in an amount of 10 to 40 parts by mass per 100 parts by mass of a total of the first and second cyclic imide compounds (A) and (B). 2 . The resin composition according to claim 1 , wherein the organic group represented by A in the formula (1) is any one of tetravalent organic groups represented by the following structural formulae: wherein bonds that are yet unbonded to substituent groups are to be bonded to carbonyl carbons forming the cyclic imide structures in the formula (1). 3 . A prepreg comprising the resin composition according to claim 1 . 4 . A copper-clad laminate comprising the prepreg according to claim 3 . 5 . A printed-wiring board comprising the copper-clad laminate according to claim 4 .

Assignees

Inventors

Classifications

  • Compositions of epoxy resins; Compositions of derivatives of epoxy resins · CPC title

  • using glass fibres · CPC title

  • reinforced, e.g. by fibres, fabrics (H05K1/036 takes precedence) · CPC title

  • C08G59/44Primary

    Amides · CPC title

  • characterised by the additives used in the prepolymer mixture · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US2025084205A1 cover?
Provided is a resin composition containing: (A) a first cyclic imide compound of the following formula (1): wherein A independently represents a tetravalent organic group having a cyclic structure, Q independently represe…
Who is the assignee on this patent?
Shinetsu Chemical Co
What technology area does this patent fall under?
Primary CPC classification C08G59/44. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Mar 13 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).