In-Vacuum Rotatable RF Component

Patent metadata

Field	Value
Publication number	US-2025079116-A1
Application number	US-202318239988-A
Country	US
Kind code	A1
Filing date	Aug 30, 2023
Priority date	Aug 30, 2023
Publication date	Mar 6, 2025
Grant date	—

Abstract

An apparatus that may be used to allow the rotation of a component that passes through a wall of a vacuum chamber is disclosed. The apparatus includes a rotatable shaft through which the component passes. The rotatable shaft is held in place using a holder, which retains a portion of the rotatable shaft. In some embodiments, the holder is affixed to a plate, which is then affixed to the chamber wall. The plate has an opening which is aligned to the opening in the chamber wall. A portion of the rotatable shaft passes through the opening in the plate and vacuum seals are disposed between the rotatable shaft and the plate. This apparatus may be used to allow use of rotatable components in an ion implanter.

First claim

1 . An apparatus to allow rotation of a component within a vacuum chamber, comprising:
a plate having an opening configured to be affixed to a chamber wall having an opening, wherein the opening of the plate aligns with the opening in the chamber wall; a rotatable shaft, having an extended portion that extends into the opening of the plate, and a retained portion disposed adjacent to the extended portion, wherein a diameter of the retained portion is larger than a diameter of the extended portion; a holder having a linear section adjacent to the plate, and an overhang disposed at an end of the linear section and extending radially inward, such that a diameter of the linear section is greater than the diameter of the retained portion and a diameter of the overhang is smaller than the diameter of the retained portion, so as to hold the retained portion between the holder and the plate; a component disposed in a feedthrough in the rotatable shaft and configured to rotate with the rotatable shaft, extending through the opening in the chamber wall; and a first vacuum seal disposed between the extended portion and the plate.

2 . The apparatus of claim 1 , further comprising a EMI gasket disposed between the extended portion and the plate.

3 . The apparatus of claim 1 , further comprising an interface component disposed at a proximal end of the component and adjacent to an outer surface of the rotatable shaft; and
a second vacuum seal disposed between the outer surface of the rotatable shaft and a back surface of the interface component.

4 . The apparatus of claim 3 , further comprising a EMI gasket disposed between the outer surface of the rotatable shaft and the back surface of the interface component.

5 . The apparatus of claim 3 , wherein the interface component comprises a coaxial connector, wherein an outer conduit of the coaxial connector is electrically connected to the rotatable shaft; and an inner conduit of the coaxial connector is electrically connected to the component.

6 . The apparatus of claim 3 , wherein the component comprises an antenna.

7 . The apparatus of claim 3 , wherein the rotatable shaft comprises an exterior portion, adjacent to the retained portion, having a smaller diameter than the diameter of the retained portion, wherein the interface component is adjacent to the exterior portion.

8 . An ion implanter, comprising:
an ion source; a linear accelerator; and the apparatus of claim 1 ; wherein the linear accelerator is disposed within the vacuum chamber and the component is a part of the linear accelerator.

9 . An apparatus to allow rotation of a component within a vacuum chamber, comprising:
a chamber wall, defining the vacuum chamber, having an opening; a rotatable shaft, having an extended portion that extends into the opening of the chamber wall, and a retained portion disposed adjacent to the extended portion, wherein a diameter of the retained portion is larger than a diameter of the extended portion; a holder having a linear section adjacent to the chamber wall, and an overhang disposed at an end of the linear section and extending radially inward, such that a diameter of the linear section is greater than the diameter of the retained portion and a diameter of the overhang is smaller than the diameter of the retained portion, so as to hold the retained portion between the holder and the chamber wall; a component disposed in a feedthrough in the rotatable shaft and configured to rotate with the rotatable shaft, extending through the opening in the chamber wall; and a first vacuum seal disposed between the extended portion and the chamber wall.

10 . The apparatus of claim 9 , further comprising an interface component disposed at a proximal end of the component and adjacent to an outer surface of the rotatable shaft; and
a second vacuum seal disposed between the outer surface of the rotatable shaft and a back surface of the interface component.

11 . The apparatus of claim 10 , further comprising a EMI gasket disposed between the outer surface of the rotatable shaft and the back surface of the interface component.

12 . The apparatus of claim 10 , wherein the interface component comprises a coaxial connector, wherein an outer conduit of the coaxial connector is electrically connected to the rotatable shaft; and an inner conduit of the coaxial connector is electrically connected to the component.

13 . The apparatus of claim 10 , wherein the component comprises an antenna.

14 . An ion implanter, comprising:
an ion source; a linear accelerator; and the apparatus of claim 9 ; wherein the linear accelerator is disposed within the vacuum chamber and the component is a part of the linear accelerator.

15 . An ion implanter, comprising:
an ion source; and a linear accelerator, wherein the linear accelerator comprises one or more acceleration cavities, each acceleration cavity comprising a resonator coil and a tuner paddle to adjust a resonant frequency of a respective acceleration cavity, wherein the tuner paddle passes through an opening in one or more chamber walls, and into the acceleration cavity, wherein rotation of the tuner paddle is performed from outside a vacuum chamber defined by the one or more chamber walls, while maintaining vacuum.

16 . The ion implanter of claim 15 , wherein the tuner paddle comprises an antenna.

17 . The ion implanter of claim 16 , wherein the antenna is affixed to a rotatable shaft, wherein a portion of the rotatable shaft is disposed between a holder and a plate, and the plate is affixed to an outer surface of the one of the one or more chamber walls, wherein vacuum seals are disposed between the rotatable shaft and the plate and between the plate and the one of the one or more chamber walls.

18 . The ion implanter of claim 17 , wherein a coaxial connector is disposed on an outer surface of the rotatable shaft, wherein an inner conduit of the coaxial connector is in communication with the antenna; and further comprising an additional vacuum seal disposed between the coaxial connector and the outer surface of the rotatable shaft.

19 . The ion implanter of claim 18 , further comprising an EMI gasket disposed between the coaxial connector and the outer surface of the rotatable shaft.

20 . The ion implanter of claim 15 , wherein the tuner paddle is affixed to a rotatable shaft, wherein the rotatable shaft is disposed between a holder and an outer surface of the one of the one or more chamber walls, wherein and a first vacuum seal is disposed between the rotatable shaft and the one of the one or more chamber walls.

Assignees

• Applied Materials Inc

Inventors

• Carrell Michael Mason
• Webb Aaron P
• Schaller Jason M
• Park Jr William H
• Blahnik David
• Tam Wai-Ming

Classifications

• C23C14/48

  Ion implantation · CPC title

• H01J2237/20214

  Rotation · CPC title

• H01J37/20 Primary

  Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support · CPC title

• H01J2237/166

  Sealing means · CPC title

• H01J2237/0266

  electromagnetic · CPC title