Dual manufacturing process and calibration to achieve high accuracy thermal couple substrates

US2025072290A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2025072290-A1
Application numberUS-202418809681-A
CountryUS
Kind codeA1
Filing dateAug 20, 2024
Priority dateAug 25, 2023
Publication dateFeb 27, 2025
Grant date

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

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Embodiments herein are generally directed to a system and process for manufacturing temperature measurement devices for use in semiconductor and display manufacturing. A bifurcated thermocouple substrate is provided and includes a primary substrate with a substrate aperture, a secondary substrate disposed within the substrate aperture, and a thermocouple disposed within a thermocouple aperture of the secondary substrate. A method of calibrating a bifurcated thermocouple substrate includes placing a secondary substrate with an embedded thermocouple of a bifurcated thermocouple substrate into a calibrator, heating the calibrator, the secondary substrate, and the thermocouple to a number “n” of temperature points and recording the temperature readings of the calibrator and the thermocouple The method includes then performing a mathematical conversion using the recorded temperature readings, storing using the stored mathematical conversion to correct thermocouple readings during use in a substrate processing chamber.

First claim

Opening claim text (preview).

What is claimed is: 1 . A bifurcated thermocouple substrate, comprising: a primary substrate having a substrate aperture disposed therethrough; a secondary substrate disposed within the substrate aperture; and a thermocouple disposed within a thermocouple aperture of the secondary substrate. 2 . The bifurcated thermocouple substrate of claim 1 , wherein the secondary substrate comprises a thickness that is greater than a thickness of the primary substrate by at least 5%. 3 . The bifurcated thermocouple substrate of claim 1 , wherein the primary substrate and the secondary substrate comprise matching bonding apertures configured to bond the secondary substrate to the primary substrate using wire bonding. 4 . The bifurcated thermocouple substrate of claim 1 , wherein the thermocouple and the secondary substrate comprise a strain relief mechanism. 5 . The bifurcated thermocouple substrate of claim 1 , wherein the secondary substrate has a diameter that is smaller than a diameter of the substrate aperture by about 1% to about 3%. 6 . The bifurcated thermocouple substrate of claim 1 , wherein the thermocouple and the secondary substrate are calibrated such that an accuracy of the bifurcated thermocouple substrate is about +/−0.4° C. or less at 400° C. 7 . The bifurcated thermocouple substrate of claim 6 , wherein the thermocouple and the secondary substrate are calibrated prior to being disposed within the substrate aperture. 8 . A method of producing a thermocouple substrate, comprising: (a) inserting a thermocouple into a thermocouple aperture of a secondary substrate; (b) calibrating the thermocouple and secondary substrate; and (c) inserting the secondary substrate into a substrate aperture of a primary substrate. 9 . The method of claim 8 , further including; (d) adding strain relief to the thermocouple and secondary substrate; and (e) performing a thermal cycle test on the thermocouple substrate. 10 . The method of claim 9 , wherein the strain relief is a support structure securing the thermocouple to the secondary substrate. 11 . The method of claim 8 , wherein inserting the secondary substrate into the substrate aperture includes bonding the secondary substrate to the primary substrate via wire bonding. 12 . The method of claim 8 , wherein the secondary substrate comprises a diameter that is less than a diameter of the substrate aperture by about 1% to about 3%. 13 . The method of claim 8 , wherein the secondary substrate comprises a thickness that is thicker than a thickness of the primary substrate by about 5% or more. 14 . The method of claim 8 , wherein calibrating the thermocouple and secondary substrate comprises using a mathematical conversion to correct temperature readings of the thermocouple. 15 . A method of calibrating a bifurcated thermocouple substrate, comprising: (a) placing a secondary substrate with an embedded thermocouple of a bifurcated thermocouple substrate into a calibrator; (b) validating an accuracy of the calibrator to within a desired range; (c) heating the calibrator, the secondary substrate, and the thermocouple to a number “n” of temperature points and recording the temperature readings of the calibrator and the thermocouple; (d) performing a mathematical conversion, using a controller, using the recorded temperature readings of the calibrator and the thermocouple; (e) storing the mathematical conversion using the controller; and (f) using the stored mathematical conversion to correct thermocouple readings, via the controller, from the bifurcated thermocouple substrate during use in a substrate processing chamber. 16 . The method of claim 15 , wherein the accuracy of the calibrator is validated to within 0.3° C. at 400° C. 17 . The method of claim 15 , wherein the mathematical conversion corrects the temperature readings of the thermocouple to the temperature readings. 18 . The method of claim 15 , wherein the number “n” of temperature points comprises three temperature points. 19 . The method of claim 15 , wherein the thermocouple is a K-type thermocouple. 20 . The method of claim 15 , wherein placing the secondary substrate and the thermocouple into the calibrator includes placing the secondary substrate in a first holder of the calibrator and then placing a second holder containing a calibration sensor on top of the secondary substrate.

Assignees

Inventors

Classifications

  • using thermoelectric elements, e.g. thermocouples · CPC title

  • Supports; Fastening devices; Arrangements for mounting thermometers in particular locations · CPC title

  • G01K15/005Primary

    Calibration · CPC title

  • Manufacture or treatment · CPC title

  • Interconnections · CPC title

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What does patent US2025072290A1 cover?
Embodiments herein are generally directed to a system and process for manufacturing temperature measurement devices for use in semiconductor and display manufacturing. A bifurcated thermocouple substrate is provided and includes a primary substrate with a substrate aperture, a secondary substrate disposed within the substrate aperture, and a thermocouple disposed within a thermocouple aperture …
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification G01K15/005. Mapped technology areas include Physics.
When was this patent published?
Publication date Thu Feb 27 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).