Photoresist cleaning composition used in photolithography and a method for treating substrate therewith
US-10072237-B2 · Sep 11, 2018 · US
US2025051695A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2025051695-A1 |
| Application number | US-202218719693-A |
| Country | US |
| Kind code | A1 |
| Filing date | Dec 14, 2022 |
| Priority date | Dec 27, 2021 |
| Publication date | Feb 13, 2025 |
| Grant date | — |
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Cleaning fluids include at least two fluid components. The first fluid component is a hydrofluorothioether or a chlorinated hydrofluoroolefin, or at least one of the isomers of a hydrochlorofluoroolefin, and the second fluid component is an alcohol with 1-5 carbon atoms. The cleaning fluid provides enhanced removal of particulate contamination, improved reduction of particle reattachment, or a combination thereof when compared to a cleaning fluid comprising a fluorinated fluid.
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What is claimed is: 1 . A cleaning fluid comprising: a first fluid component comprising a hydrofluorothioether of Structure 1: R 1 —S—R f 1 Structure 1 wherein R 1 is a nonfluorinated alkyl group with 1-3 carbon atoms; R f 1 is a fluorinated or perfluorinated group containing 2-6 carbon atoms and optionally comprises one or more catenated heteroatoms; or a chlorinated hydrofluoroolefin of Structure 2 cis-(CF 3 )HC═CHCl; Structure 2; or at least one of the two isomers of hydrochlorofluoroolefin of Structure 3, HClC=CF(CF 2 H) Structure 3 at least one of the two isomers of hydrochlorofluoroolefin of Structure 4, FClC═CH(CF 2 H) Structure 4 or a mixture thereof, and a second fluid component comprising at least one alcohol comprising structure 5: R 2 —OH Structure 5 wherein R 2 is an alkyl group with 1-5 carbon atoms, wherein the cleaning fluid provides enhanced removal of particulate contamination, improved reduction of particle reattachment, or a combination thereof when compared to a cleaning fluid comprising a fluorinated fluid. 2 . The cleaning fluid of claim 1 , wherein the first fluid component comprises a hydrofluorothioether of Structure 1: wherein R 1 is an alkyl group with 1 carbon atom; and R f 1 is a —CR f 3 R f 4 F group wherein R f 3 and R f 4 are independently perfluorinated alkyl groups with 1-3 carbon atoms. 3 . The cleaning fluid of claim 2 , wherein R f 3 and R f 4 are perfluorinated alkyl groups with 1 carbon atom. 4 . The cleaning fluid of claim 1 , wherein the first fluid component comprises 85-99.9% by weight of cleaning fluid. 5 . The cleaning fluid of claim 1 , wherein the second fluid component comprises an alcohol where R 2 is an alkyl group with 1-4 carbon atoms. 6 . The cleaning fluid of claim 5 , wherein the second fluid component comprises an alcohol where R 2 is an alkyl group with 2-3 carbon atoms. 7 . The cleaning fluid of claim 6 , wherein the second fluid component comprises iso-propanol, and wherein the cleaning fluid provides improved particle removal when compared to cleaning fluid comprising a fluorinated fluid. 8 . The cleaning fluid of claim 7 , further comprising at least a third fluid component, wherein the third fluid component comprises an alcohol. 9 . The cleaning fluid of claim 1 , wherein the second fluid component comprises an alcohol where R 2 is an alkyl group with 4 carbon atoms. 10 . The cleaning fluid of claim 1 , wherein the second fluid component comprises butanol, and wherein the cleaning fluid provides an improved reduction of particle re-attachment when compared to cleaning fluid comprising a fluorinated fluid. 11 . The cleaning fluid of claim 10 , further comprising at least a third fluid component, wherein the third fluid component comprises an alcohol. 12 . The cleaning fluid of claim 1 , wherein the cleaning fluid is non-flammable. 13 . A method of cleaning an article comprising: providing an article to be cleaned comprising at least one surface that comprises at least one contaminant; providing a cleaning fluid comprising: a first fluid component comprising a hydrofluorothioether of Structure 1: R 1 —S—R f 1 Structure 1 wherein R 1 is a nonfluorinated alkyl group with 1-3 carbon atoms; R f 1 is a fluorinated or perfluorinated group containing 2-6 carbon atoms and optionally comprises one or more catenated heteroatoms; or a chlorinated hydrofluoroolefin of Structure 2 cis-(CF 3 )HC═CHCl; Structure 2; or at least one of the two isomers of hydrochlorofluoroolefin of Structure 3, HClC=CF(CF 2 H) Structure 3 at least one of the two isomers of hydrochlorofluoroolefin of Structure 4, FClC═CH(CF 2 H) Structure 4 or a mixture thereof, and a second fluid component comprising at least one alcohol comprising structure 5: R 2 —OH Structure 5 wherein R 2 is an alkyl group with 1-5 carbon atoms; and contacting the substrate surface with the cleaning fluid. 14 . The method of claim 13 , wherein contacting the substrate surface with the cleaning fluid comprises applying the cleaning fluid by brushing, spraying, or spin coating. 15 . The method of claim 13 , wherein contacting the substrate surface with the cleaning fluid comprises immersion of the substrate in the cleaning fluid. 16 . The method of claim 13 , further comprising removing the cleaning fluid from the substrate surface. 17 . The method of claim 16 , wherein removing the cleaning fluid from the substrate surface comprises evaporating the cleaning fluid or removing the substrate from immersion in the cleaning fluid.
Cleaning during device manufacture · CPC title
containing oxygen · CPC title
Halogenated solvents · CPC title
Electronic devices, e.g. PCBs or semiconductors · CPC title
Alcohols; Phenols · CPC title
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