Information displaying method and computer program product for semiconductor manufacturing apparatus
US-2024231313-A1 · Jul 11, 2024 · US
US2024385611A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2024385611-A1 |
| Application number | US-202418596193-A |
| Country | US |
| Kind code | A1 |
| Filing date | Mar 5, 2024 |
| Priority date | Apr 27, 2023 |
| Publication date | Nov 21, 2024 |
| Grant date | — |
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A method comprises determining that a batch generated in an industrial process (IP) is anomalous at a sample point k during the batch, the batch is ongoing; determining a process variable (PV) of the IP based on a variable contribution of the PV towards the batch being anomalous at the sample point k; determining a recommended value of the PV based on an anomaly metric corresponding to the sample point k of an assessment batch, the assessment batch is created based on sample(s) of the batch at the sample point k and the recommended value of the PV, the anomaly metric corresponding to the sample point k of the assessment batch is determined based on a T2-statistic metric corresponding to the sample point k and a Q-statistic metric corresponding to the sample point k of the assessment batch; and adjusting the IP based on the recommended value of the PV.
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What is claimed is: 1 . A method comprising: determining, by a batch management system, that a batch generated in an industrial process is anomalous at a sample point k during the batch, wherein the batch is ongoing; determining, by the batch management system, a process variable of the industrial process based on a variable contribution of the process variable towards the batch being anomalous at the sample point k during the batch; determining, by the batch management system, a recommended value of the process variable based on an anomaly metric corresponding to the sample point k of an assessment batch, wherein the assessment batch is created based on one or more samples of the batch at the sample point k and the recommended value of the process variable, and the anomaly metric corresponding to the sample point k of the assessment batch is determined based on a T 2 -statistic metric corresponding to the sample point k and a Q-statistic metric corresponding to the sample point k of the assessment batch in a principal component analysis (PCA) model corresponding to the sample point k of the industrial process; and adjusting, by the batch management system, the industrial process based on the recommended value of the process variable. 2 . The method of claim 1 , wherein: the assessment batch has a lowest anomaly metric corresponding to the sample point k in the PCA model corresponding to the sample point k among one or more assessment batches that are respectively created based on one or more candidate values of the process variable. 3 . The method of claim 1 , wherein determining the recommended value of the process variable includes: computing a normalized T 2 -statistic metric corresponding to the sample point k of the assessment batch based on the T 2 -statistic metric corresponding to the sample point k of the assessment batch and a confidence limit of the T 2 -statistic metric corresponding to the sample point k; computing a normalized Q-statistic metric corresponding to the sample point k of the assessment batch based on the Q-statistic metric corresponding to the sample point k of the assessment batch and a confidence limit of the Q-statistic metric corresponding to the sample point k; and determining the anomaly metric corresponding to the sample point k of the assessment batch to be a highest value between the normalized T 2 -statistic metric corresponding to the sample point k and the normalized Q-statistic metric corresponding to the sample point k of the assessment batch. 4 . The method of claim 1 , wherein: the PCA model corresponding to the sample point k is created based on a batch portion of each non-anomalous batch among a plurality of non-anomalous batches generated in the industrial process, wherein the batch portion of a non-anomalous batch is generated between a start point of the non-anomalous batch and the sample point k during the non-anomalous batch. 5 . The method of claim 1 , wherein determining the recommended value of the process variable includes: determining, for each non-anomalous batch among a plurality of non-anomalous batches generated in the industrial process that are used to generate the PCA model corresponding to the sample point k, an anomaly metric corresponding to the sample point k of the non-anomalous batch; selecting, from the plurality of non-anomalous batches, a non-anomalous batch that has a lowest anomaly metric corresponding to the sample point k to be a reference batch; identifying a sample of the reference batch that is collected at the sample point k during the reference batch; and identifying a value of the process variable in the identified sample of the reference batch to be an initial candidate value of the process variable. 6 . The method of claim 1 , wherein determining the recommended value of the process variable includes: selecting an initial type of adjustment from an increasing adjustment and a decreasing adjustment; and performing, at a start point of a sequence of computing cycles, a first computing cycle with an initial candidate value of the process variable and a current type of adjustment being the initial type of adjustment. 7 . The method of claim 6 , wherein performing the first computing cycle in the sequence of computing cycles includes: creating a particular assessment batch based on the one or more samples of the batch at the sample point k and the initial candidate value of the process variable; determining an anomaly metric corresponding to the sample point k of the particular assessment batch using the PCA model corresponding to the sample point k; and updating the recommended value of the process variable to be equal to the initial candidate value of the process variable. 8 . The method of claim 6 , wherein determining the recommended value of the process variable includes: performing a particular computing cycle that is not the first computing cycle in the sequence of computing cycles based on a preceding computing cycle, wherein the preceding computing cycle is performed sequentially prior to the particular computing cycle in the sequence of computing cycles. 9 . The method of claim 8 , wherein performing the particular computing cycle in the sequence of computing cycles includes: obtaining a first candidate value of the process variable and an anomaly metric corresponding to the sample point k of a first assessment batch that are associated with the preceding computing cycle, wherein the first candidate value of the process variable is evaluated in the preceding computing cycle, and the first assessment batch is created based on the one or more samples of the batch at the sample point k and the first candidate value of the process variable; determining a second candidate value of the process variable based on the first candidate value of the process variable and a predefined adjustment amount being applied in the current type of adjustment; creating a second assessment batch based on the one or more samples of the batch at the sample point k and the second candidate value of the process variable; determining an anomaly metric corresponding to the sample point k of the second assessment batch using the PCA model corresponding to the sample point k; and comparing the anomaly metric corresponding to the sample point k of the first assessment batch and the anomaly metric corresponding to the sample point k of the second assessment batch. 10 . The method of claim 9 , wherein performing the particular computing cycle in the sequence of computing cycles includes: determining that the second candidate value of the process variable is within an operation range of the process variable, wherein the operation range of the process variable specifies a maximum value and a minimum value that are establishable for the process variable. 11 . The method of claim 9 , wherein comparing the anomaly metric corresponding to the sample point k of the first assessment batch and the anomaly metric corresponding to the sample point k of the second assessment batch includes: determining that the anomaly metric corresponding to the sample point k of the second assessment batch is lower than or equal to the anomaly metric corresponding to the sample point k of the first assessment batch; updating, in response to determining that the anomaly metric corresponding to the sample point k of the second assessment batch is lower than or equal to the anomaly metric corresponding to the sample point k of the first assessment batch, the recommended value of the process variable to be equal to the second candidate value of the process variable; and performing a following computing cycle tha
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