Apparatus for Treating Water using a Plasma Source that is Protected from Water

Patent metadata

Field	Value
Publication number	US-2024199451-A1
Application number	US-202218287290-A
Country	US
Kind code	A1
Filing date	Apr 28, 2022
Priority date	Apr 28, 2021
Publication date	Jun 20, 2024
Grant date	—

Abstract

Apparatus for treating water is provided where the apparatus includes a reaction chamber having an air-water interface and a plasma applicator disposed in air in proximity to the air-water interface. The plasma applicator includes a solid dielectric plate sandwiched between a first electrode and a second electrode, where the first electrode is closer to the water than the second electrode. The plasma applicator further includes a first insulating layer disposed on the first electrode. The apparatus is configured to generate a plasma between the first insulating layer and the air-water interface during operation.

First claim

1 . Apparatus for treating water, the apparatus comprising:
a reaction chamber having an air-water interface; a plasma applicator disposed in air in proximity to the air-water interface, wherein the plasma applicator includes a solid dielectric plate sandwiched between a first electrode and a second electrode, wherein the first electrode is closer to the water than the second electrode, and wherein the plasma applicator further includes a first insulating layer disposed on the first electrode; wherein the apparatus is configured to generate a plasma between the first insulating layer and the air-water interface during operation.

2 . The apparatus of claim 1 , wherein the apparatus is configured to provide nitrogen in water as nitrates and/or nitrites.

3 . The apparatus of claim 1 , wherein the apparatus is configured to acidify water.

4 . The apparatus of claim 1 , wherein the plasma has an electron energy range from 1 eV to 10 eV and wherein the plasma has a gas temperature of 1000° C. or less.

5 . The apparatus of claim 1 , wherein the first electrode is configured in a pattern selected from the group consisting of: square meshes, rectangular meshes, triangular meshes, hexagonal meshes and 1D arrays of elements.

6 . The apparatus of claim 1 , wherein the reaction chamber is configured as a water reservoir.

7 . The apparatus of claim 1 , wherein the reaction chamber is configured as a flow chamber through which water from a reservoir is pumped.

8 . The apparatus of claim 1 , further comprising a gas circulation system.

9 . The apparatus of claim 8 , wherein the gas circulation system is configured to bubble air containing activated chemical species from the plasma through the water.

10 . The apparatus of claim 8 , wherein the gas circulation system is configured to provide oxygenated air to the plasma.

11 . The apparatus of claim 1 , further comprising a heat sink affixed to the plasma applicator.

12 . The apparatus of claim 11 , further comprising a second insulating layer sandwiched between the second electrode and the heat sink.

Assignees

• Univ Leland Stanford Junior

Inventors

• Wang Benjamin
• Rogers David B
• Cappelli Mark A

Classifications

• H05H2242/10

  Cooling arrangements · CPC title

• H05H1/2406

  using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes · CPC title

• C05C1/00

  Ammonium nitrate fertilisers · CPC title

• C02F2103/02

  Non-contaminated water, e.g. for industrial water supply · CPC title

• C02F1/68

  by addition of specified substances, e.g. trace elements, for ameliorating potable water (medicinal water A61K) · CPC title