3d interposer with through glass vias - method of increasing adhesion between copper and glass surfaces and articles therefrom

US2024140864A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2024140864-A1
Application numberUS-202418409103-A
CountryUS
Kind codeA1
Filing dateJan 10, 2024
Priority dateNov 13, 2018
Publication dateMay 2, 2024
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

In some embodiments, a method comprises: depositing an adhesion layer comprising manganese oxide (MnO x ) onto a surface of a glass or glass ceramic substrate; depositing a first layer of conductive metal onto the adhesion layer; and annealing the adhesion layer in a reducing atmosphere. Optionally, the method further comprises pre-annealing the adhesion layer in an oxidizing atmosphere before annealing the adhesion layer in a reducing atmosphere.

First claim

Opening claim text (preview).

What is claimed is: 1 . An article comprising: a substrate comprised of glass or glass ceramic; an adhesion layer on the substrate, the adhesion layer comprising manganese oxide (MnO x ), and the manganese oxide directly contacting the glass or glass ceramic; and a copper layer deposited on the adhesion layer, wherein the adhesion layer comprises an oxidation gradient such that the adhesion layer has a relatively higher oxidation state adjacent to the substrate and a relatively lower oxidation state adjacent to the copper layer. 2 . The article of claim 1 , wherein the substrate is comprised of fused silica glass, aluminoborosilicate glass, or the glass ceramic, and the manganese oxide directly contacts the fused silica glass, the aluminoborosilicate glass, or the glass ceramic. 3 . The article of claim 1 , wherein substrate is comprised of fused silica glass or aluminoborosilicate glass, and the manganese oxide directly contacts the fused silica glass or the aluminoborosilicate glass. 4 . The article of claim 1 , wherein the adhesion layer consists essentially of the manganese oxide. 5 . The article of claim 1 , wherein the adhesion layer adjacent to the substrate with the relatively higher oxidation state comprises MnO 2 , and the adhesion layer adjacent to the copper layer with the relatively lower oxidation state comprises MnO. 6 . The article of claim 1 , wherein the substrate comprises a via hole formed through the substrate, and the adhesion layer is on an interior surface of the via hole. 7 . The article of claim 6 , wherein the via hole comprises a first opening on a first surface of the substrate and a second opening on a second surface of the substrate and a waist between the first opening and the second opening, the waist comprising a diameter that is at least 70% of a diameter of the first opening or the second opening. 8 . The article of claim 6 , wherein the via hole has an aspect ratio from about 1:1 to about 10:1. 9 . The article of claim 8 , wherein the aspect ratio of the via hole is from about 2:1 to about 9:1. 10 . The article of claim 1 , wherein the adhesion layer has a thickness of about 3 nm or more. 11 . The article of claim 10 , wherein the thickness of the adhesion layer is about 6 nm or more. 12 . The article of claim 11 , wherein the thickness of the adhesion layer is from about 6 nm to about 9 nm. 13 . The article of claim 1 , wherein the copper layer has a thickness from about 1 micron to about 100 microns. 14 . The article of claim 1 , wherein: the substrate is comprised of fused silica glass or aluminoborosilicate glass, the manganese oxide directly contacting the fused silica glass or the aluminoborosilicate glass, the adhesion layer consists essentially of the manganese oxide, and the substrate comprises a via hole formed through the substrate, the adhesion layer being on an interior surface of the via hole. 15 . The article of claim 14 , wherein the adhesion layer adjacent to the substrate with the relatively higher oxidation state comprises MnO 2 , and the adhesion layer adjacent to the copper layer with the relatively lower oxidation state comprises MnO.

Assignees

Inventors

Classifications

  • C03C27/048Primary

    consisting of an adhesive specially adapted for that purpose · CPC title

  • by deposition from the vapour phase · CPC title

  • Coatings of the type glass/inorganic compound/metal · CPC title

  • metallic substrate · CPC title

  • Heat-treatment · CPC title

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Frequently asked questions

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What does patent US2024140864A1 cover?
In some embodiments, a method comprises: depositing an adhesion layer comprising manganese oxide (MnO x ) onto a surface of a glass or glass ceramic substrate; depositing a first layer of conductive metal onto the adhesion layer; and annealing the adhesion layer in a reducing atmosphere. Optionally, the method further comprises pre-annealing the adhesion layer in an oxidizing atmosphere before …
Who is the assignee on this patent?
Corning Inc
What technology area does this patent fall under?
Primary CPC classification C03C27/048. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu May 02 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).