Plastic substrate having a porous layer and method for producing the porous layer
US-9499902-B2 · Nov 22, 2016 · US
US2024093343A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2024093343-A1 |
| Application number | US-202017766764-A |
| Country | US |
| Kind code | A1 |
| Filing date | Oct 8, 2020 |
| Priority date | Oct 8, 2019 |
| Publication date | Mar 21, 2024 |
| Grant date | — |
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The present invention relates to a method for manufacturing a part, comprising the steps of chemically etching, in a wet acid medium, at least a portion of a surface of a substrate made of a monocrystalline superalloy, comprising at least one element chosen from rhenium and ruthenium, the substrate having a γ-γ′ phase, the substrate having an average mass fraction of rhenium and/or ruthenium greater than or equal to 3%, the chemical etching being done in such a way that the average mass fraction of rhenium and/or ruthenium over the portion of the surface of the substance is less than 2%, and a step of depositing on the portion of the substrate a protective coating having a γ-γ′ phase and an average mass fraction of rhenium and/or ruthenium of less than 1%.
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1 . A method for manufacturing a part, comprising the steps of: a) chemical attack, in a wet acid medium, of at least a portion of a surface of a substrate made of a monocrystalline superalloy, comprising at least one element chosen from rhenium and ruthenium, the substrate having a γ-γ′ phase, the substrate having an average mass fraction of rhenium and/or ruthenium greater than or equal to 3%, the chemical attack being carried out in such a way that the average mass fraction of rhenium and/or ruthenium over the portion of the surface of the substrate is less than 2%, b) depositing on the at least a portion of the substrate a protective coating having a γ-γ′ phase and an average mass fraction of rhenium and/or ruthenium of less than 1%. 2 . The method according to claim 1 , wherein the substrate is made of nickel-based monocrystalline superalloy. 3 . The method according to claim 1 , wherein the substrate comprises chromium, the average mass fraction of chromium being less than 5%. 4 . The method according to one of claim 1 , wherein the chemical attack is a chemical etching. 5 . The method according to claim 1 , wherein the chemical attack is carried out so that the at least a portion of the surface of the substrate has an arithmetic average roughness R a between 0.5 μm and 5 μm, the arithmetic average roughness R a being measured over an area greater than 1 mm 2 . 6 . The method according to claim 1 , wherein the chemical attack in acid medium is carried out by a bath in contact with the at least a portion of the surface of the substrate, the bath comprising at least one element from hydrofluoric acid, nitric acid with ferric chloride and with hydrochloric acid, hydrochloric acid with ferric chloride, hydrochloric acid with hydrogen peroxide, and nitric acid with hydrochloric acid. 7 . The method according to claim 1 , wherein the chemical attack in acid medium is carried out by a bath in contact with the at least a portion of the surface of the substrate, an electrical potential of the bath being controlled so as to cause an electrochemical reaction on the at least a portion of the surface, the bath comprising at least one element from nitric acid and acetic acid, sulfuric acid, and phosphoric acid. 8 . A part, comprising: a substrate made of a monocrystalline superalloy, comprising at least one element chosen from rhenium and ruthenium, the substrate having a γ-γ′ phase, an average mass fraction of rhenium and/or ruthenium greater than or equal to 3%, a protective coating covering at least a portion of a surface of the substrate, wherein the average mass fraction of rhenium and/or ruthenium on the portion of the surface of the substrate is less than 2%, and the protective coating has a γ-γ′ phase and an average mass fraction of rhenium and/or ruthenium of less than 1%. 9 . The part according to claim 8 , wherein the substrate comprises chromium, the average mass fraction of chromium being less than 5%. 10 . The part according to claim 8 , wherein the at least a portion of the surface of the substrate has an arithmetic average roughness R a between 0.5 μm and 5 μm, the arithmetic average roughness R a being measured over an area greater than 1 mm 2 and being obtained by chemical attack in a wet acid medium of the at least a portion of the surface of the substrate. 11 . The part according to claim 8 , wherein the protective coating has predominantly by volume a γ′ phase. 12 . The part according to claim 8 , wherein the protective coating comprises at least nickel, aluminium, chromium, hafnium and silicon. 13 . The part according to claim 12 , wherein the protective coating has: a majority average mass fraction of nickel, an average mass fraction of aluminium between 5% and 15%, an average mass fraction of chromium between 7% and 15%, an average mass fraction of hafnium between 0.5% and 2%, and an average mass fraction of silicon between 0.5% and 3%. 14 . The part according to claim 8 , wherein the part is an aircraft part. 15 . An aircraft turbine comprising a part according to claim 8 . 16 . An aircraft comprising a part according to claim 8 . 17 . The method according to claim 1 , wherein the substrate has an average mass fraction of rhenium and/or ruthenium greater than or equal to 4%. 18 . The method according to claim 1 , wherein the chemical attack is carried out so that the at least a portion of the surface of the substrate has a maximum roughness R Z between 5.5 μm and 50 μm, the maximum roughness R Z being measured over an area greater than 1 mm 2 . 19 . The part according to claim 8 , wherein the substrate has an average mass fraction of rhenium and/or ruthenium greater than or equal to 4%. 20 . The part according to claim 8 , wherein the at least a portion of the surface of the substrate has a maximum roughness R Z between 5.5 μm and 50 μm, the maximum roughness R Z being measured over an area greater than 1 mm 2 and being obtained by chemical attack in a wet acid medium of the at least a portion of the surface of the substrate.
Cleaning or etching treatments · CPC title
all layers being exclusively metallic {(making layered metal workpieces by pressure cladding B23K20/22; making coatings with a metallic material characterised by its composition C23C30/00)} · CPC title
without Mo and W · CPC title
on metallic substrates or on substrates of boron or silicon · CPC title
Nickel or cobalt · CPC title
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