Plastic substrate having a porous layer and method for producing the porous layer

Patent metadata

Field	Value
Publication number	US-9499902-B2
Application number	US-201313741147-A
Country	US
Kind code	B2
Filing date	Jan 14, 2013
Priority date	Jan 13, 2012
Publication date	Nov 22, 2016
Grant date	Nov 22, 2016

Abstract

A plastic substrate has a porous layer on a surface. The porous layer is formed at least partially from a material of the plastic substrate and has pores. The proportion by volume of pores is greater in a first region of the porous layer than in a second region of the porous layer. The second region follows the first region, as seen proceeding from the plastic substrate. The porous layer can be produced by a plasma process that simultaneously effects structuring of the plastic substrate by ion bombardment and coating of the plastic substrate.

First claim

What is claimed is:

1. A method for producing a plastic substrate and a porous layer, the method comprising:
forming the porous layer using a plasma process, the plasma process simultaneously bringing about structuring of the plastic substrate by an ion bombardment and coating of the plastic substrate; and
forming a solid phase of the porous layer, wherein at least 10% of the porous layer comprises material of the plastic substrate,
wherein a proportion by volume of pores is greater in a first region of the porous layer than in a second region of the porous layer,
wherein the first region is located between the second region and the plastic substrate,
wherein the porous layer has a thickness between 50 nm and 500 nm, and
wherein the pores, on average, have a lateral extent between 20 nm and 200 nm.

2. The method according to claim 1 , wherein the ion bombardment of the plastic substrate is effected by negative ions.

3. The method according to claim 2 , wherein the negative ions are produced by a magnetic field assisted glow discharge in a process gas, the magnetic field assisted glow discharge being produced by a magnetron, which has an electrode and at least one magnet for generating a magnetic field.

4. The method according to claim 3 , wherein the process gas has at least one electronegative constituent, such that the negative ions are produced during the magnetic field assisted glow discharge.

5. The method according to claim 3 , wherein the coating of the plastic substrate is effected at least partially by sputtering of a material of the electrode.

6. The method according to claim 1 , wherein the plasma process includes a process gas that contains at least 15% oxygen.

7. The method according to claim 1 , wherein
the ion bombardment of the plastic substrate is effected by negative ions, which are produced by a magnetic field assisted glow discharge in a process gas,
the magnetic field assisted glow discharge is produced by a magnetron, which has an electrode and at least one magnet for generating a magnetic field,
the process gas has at least one electronegative constituent, such that the negative ions are produced during the magnetic field assisted glow discharge, and
the negative ions, which are produced on a surface of the electrode, are accelerated in a direction of the plastic substrate by an electrical voltage applied to the electrode.

8. The method according to claim 7 , wherein the process gas contains at least 15% oxygen.

9. The method according to claim 7 , wherein the coating of the plastic substrate is effected at least partially by sputtering of a material of the electrode.

10. The method according to claim 1 , wherein the plastic substrate is coated with at least one material selected from the group consisting of Al, Mg, Zn, Sn, Si, Ti, C, V, Cr, Fe, Cu, In, Ag, Zr, Hf, Ta, W, Ce or a chemical compound or alloy comprising at least one of these materials.

11. The method according to claim 1 , further comprising forming a further layer over the porous layer.

12. A method for producing a plastic substrate and a porous layer, the method comprising:
forming the porous layer using a plasma process, the plasma process simultaneously bringing about structuring of the plastic substrate by an ion bombardment and coating of the plastic substrate, and
forming a solid phase of the porous layer, wherein at least 10% of the porous layer comprises material of the plastic substrate, wherein the porous layer is formed at least partially from a material of the plastic substrate and has pores,
wherein a proportion by volume of the pores is greater in a first region of the porous layer than in a second region of the porous layer,
wherein the first region is located between the second region and the plastic substrate, the porous layer having a thickness between 50 nm and 500 nm, and the pores, on average, having a lateral extent between 20 nm and 200 nm,
wherein the ion bombardment of the plastic substrate is effected by negative ions which are produced by a magnetic field assisted glow discharge in a process gas,
wherein the magnetic field assisted glow discharge is produced by a magnetron which has an electrode and at least one magnet for generating a magnetic field,
wherein the process gas has at least one electronegative constituent such that the negative ions are produced during the magnetic field assisted glow discharge, and
wherein the negative ions, which are produced on a surface of the electrode, are accelerated in a direction of the plastic substrate by an electrical voltage applied to the electrode.

Assignees

• Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E V
• Fraunhofer Ges Forschung

Inventors

• Schulz Ulrike
• Munzert Peter
• Fahland Matthias
• Schoenberger Waldemar

Classifications

• C23C14/021 Primary

  Cleaning or etching treatments · CPC title

• G02B5/282

  reflecting for infrared and transparent for visible light, e.g. heat reflectors, laser protection · CPC title

• Y10T428/249961

  With gradual property change within a component · CPC title

• C23C14/48 Primary

  Ion implantation · CPC title

• G02B2207/107

  Porous materials, e.g. for reducing the refractive index · CPC title