Coated round wire
US-2024368794-A1 · Nov 7, 2024 · US
US2024018680A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2024018680-A1 |
| Application number | US-202118265096-A |
| Country | US |
| Kind code | A1 |
| Filing date | Jul 14, 2021 |
| Priority date | Dec 10, 2020 |
| Publication date | Jan 18, 2024 |
| Grant date | — |
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There is provided an Ag-coated material and its related technique, including a base material and an Ag film on the base material, the Ag film including alternately laminated at least three Ag layers with average crystal grain sizes different by three times or more.
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1 . An Ag-coated material, including a base material and an Ag film on the base material, the Ag film including alternately laminated at least three Ag layers with average crystal grain sizes different by three times or more. 2 . The Ag-coated material according to claim 1 , wherein the Ag film includes Ag layers of four or more lamination. 3 . The Ag-coated material according to claim 1 , wherein the Ag film includes Ag layers of alternately laminated Ag layer 1 comprising Ag with a small average crystal grain size and Ag layer 2 comprising Ag with a larger average crystal grain size than the Ag layer 1, from a side closer to the base material. 4 . The Ag-coated material according to claim 3 , wherein an average crystal grain size (area average grain size) of the Ag layer 1 is 0.2 μm or less. 5 . The Ag-coated material according to claim 3 , wherein an average crystal grain size (area average grain size) of the Ag layer 2 is 0.3 μm or more. 6 . The Ag-coated material according to claim 3 , wherein the Ag layer 1 has a thickness of 0.5 to 5 μm. 7 . The Ag-coated material according to claim 3 , wherein the Ag layer 2 has a thickness of 0.5 to 5 μm. 8 . The Ag-coated material according to claim 3 , wherein a preferential orientation plane of the Ag layer 1 is {111} plane, and a preferential orientation plane of the Ag layer 2 is {100} plane. 9 . The Ag-coated material according to claim 3 , wherein an outermost layer of the Ag-coated material is the Ag layer 2. 10 . The Ag-coated material according to claim 1 , wherein an underlying layer comprising Ni is provided between the base material and the Ag film. 11 . The Ag-coated material according to claim 1 , wherein the base material comprises Cu or Cu alloy. 12 . The Ag-coated material according to claim 1 , wherein Vickers hardness HV of the Ag-coated material is 100 or more. 13 . The method for producing an Ag-coated material, including: forming an Ag film on a base material by alternately laminating at least three Ag layers with different average crystal grain sizes by three times or more. 14 . The method for producing an Ag-coated material according to claim 13 , wherein the Ag film is formed by laminating four or more Ag layers. 15 . The method for producing an Ag-coated material according to claim 13 , wherein Ag layer 1 comprising Ag with a small average crystal grain size and Ag layer 2 comprising Ag with a larger average crystal grain size than the Ag layer 1 are alternately formed on the base material. 16 . The method for producing an Ag-coated material according to claim wherein the Ag layer 1 has an average crystal grain size (area average grain size) of 0.2 μm or less. 17 . The method for producing an Ag-coated material according to claim 15 , wherein the Ag layer 2 has an average crystal grain size (area average grain size) of 0.3 μm or more. 18 . The method for producing an Ag-coated material according to claim 15 , wherein the Ag layer 1 has a thickness of 0.5 to 5 μm. 19 . The method for producing an Ag-coated material according to claim 15 , wherein the Ag layer 2 has a thickness of 0.5 to 5 μm. 20 . The method for producing an Ag-coated material according to claim 15 , wherein a preferential orientation plane of the Ag layer 1 is {111} plane, and a preferential orientation plane of the Ag layer 2 is {100} plane. 21 . The method for producing an Ag-coated material according to claim 15 , including: forming the Ag layer 2 as an outermost layer of the Ag-coated material. 22 . The method for producing an Ag-coated material according to claim 15 , including: forming the Ag layer 1 by electroplating using an Ag plating solution 1 containing potassium silver cyanide, potassium cyanide, and potassium selenocyanate under conditions of a solution temperature of 10 to 35° C. and a current density of 3 to 15 A/dm 2 , wherein the Ag plating solution 1 is an aqueous solution containing: 80 to 130 g/L of silver, 60 to 160 g/L of potassium cyanide, and 50 to 80 mg/L of selenium. 23 . The method for producing an Ag-coated material according to claim 22 , wherein 55 to 70 mg/L of the selenium is contained. 24 . The method for producing an Ag-coated material according to claim 22 , wherein the electroplating is performed under a condition that a product of a concentration of potassium cyanide in the Ag plating solution 1 and a current density is 840 g·A/L·dm 2 or less. 25 . The method for producing an Ag-coated material according to claim 15 , comprising: forming the Ag layer 2 by electroplating using a silver plating solution 2 containing potassium silver cyanide, potassium cyanide, and potassium selenocyanate at a solution temperature of 10 to 40° C. and a current density of 3 to 10 A/dm 2 , wherein the silver plating solution 2 is an aqueous solution containing: 80 to 110 g/L of silver, 70 to 160 g/L of potassium cyanide, and 1 to 15 mg/L of selenium. 26 . The method for producing an Ag-coated material according to claim 13 , comprising: forming an underlying layer comprising Ni on the base material; and forming the Ag film on the underlying layer. 27 . The method for producing an Ag-coated material according to claim 13 , wherein the base material comprises Cu or Cu alloy. 28 . A terminal component, wherein the Ag-coated material according to claim 1 is used as a constituent material.
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