Apparatus for manufacturing display apparatus and method of manufacturing display apparatus

Patent metadata

Field	Value
Publication number	US-2023395365-A1
Application number	US-202318205370-A
Country	US
Kind code	A1
Filing date	Jun 2, 2023
Priority date	Jun 7, 2022
Publication date	Dec 7, 2023
Grant date	—

Abstract

A method of manufacturing a display apparatus, the method includes removing an oxide layer formed on a surface of a substrate by utilizing a hydrofluoric acid gas and an ammonia gas, and thermally treating the substrate from which the oxide layer has been removed. A flow ratio between the hydrofluoric acid gas and the ammonia gas is about 0.8:1 to about 1:1.

First claim

What is claimed is:

1 . A method of manufacturing a display apparatus, the method comprising:
removing an oxide layer formed on a surface of a substrate by utilizing a hydrofluoric acid gas and an ammonia gas; and thermally treating the substrate from which the oxide layer has been removed, wherein a flow ratio between the hydrofluoric acid gas and the ammonia gas is about 0.8:1 to about 1:1.

2 . The method of claim 1 , wherein the oxide layer is removed by a salt formation reaction during the removing of the oxide layer.

3 . The method of claim 2 , wherein a salt is formed by the salt formation reaction during the removing of the oxide layer.

4 . The method of claim 3 , wherein the formed salt is removed by a salt decomposition reaction during the thermally treating of the substrate.

5 . The method of claim 1 , wherein the removing of the oxide layer is performed in a first chamber, and the thermally treating of the substrate is performed in a second chamber.

6 . The method of claim 5 , wherein the hydrofluoric acid gas and the ammonia gas are separately supplied to the first chamber.

7 . The method of claim 6 , wherein
a shower head is arranged within the first chamber, and the hydrofluoric acid gas and the ammonia gas are mixed within the shower head or mixed before being supplied to the shower head.

8 . The method of claim 6 , wherein
a shower head and a lead that covers a top of the shower head and supports a lateral surface of the shower head are arranged within the first chamber, and the hydrofluoric acid gas and the ammonia gas are mixed within the lead or mixed after being supplied within the lead and before being supplied to the shower head.

9 . The method of claim 1 , wherein the removing of the oxide layer is performed at a temperature of about 30° C. to about 40° c.

10 . The method of claim 1 , wherein the removing of the oxide layer is performed at a process pressure of about 400 mTorr to about 600 mTorr.

11 . The method of claim 1 , wherein the thermally treating of the substrate is performed at a temperature of about 150° C. to about 350° c.

12 . A method of manufacturing a display apparatus, the method comprising:
removing an oxide layer by providing a hydrofluoric acid-ammonia mixture gas to a substrate on which the oxide layer is formed; and thermally treating the substrate from which the oxide layer has been removed, wherein the thermally treating of the substrate is performed at a temperature of about 150° C. to about 350° C.

13 . The method of claim 12 , wherein the removing of the oxide layer is performed at a temperature of about 30° C. to about 40° c.

14 . The method of claim 12 , wherein the removing of the oxide layer is performed at a process pressure of about 400 mTorr to about 600 mTorr.

15 . The method of claim 12 , wherein a flow ratio between a hydrofluoric acid gas and an ammonia gas is about 0.8:1 to about 1:1.

16 . The method of claim 15 , wherein the hydrofluoric acid gas and the ammonia gas are separately supplied to a first chamber.

17 . The method of claim 16 , wherein
a shower head is arranged within the first chamber, and the hydrofluoric acid gas and the ammonia gas are mixed within the shower head or mixed before being supplied to the shower head.

18 . The method of claim 16 , wherein
a shower head and a lead that covers a top of the shower head and supports a lateral surface of the shower head are arranged within the first chamber, and the hydrofluoric acid gas and the ammonia gas are mixed within the lead or mixed after being supplied within the lead and before being supplied to the shower head.

19 . The method of claim 12 , wherein the oxide layer is removed by a salt formation reaction during the removing of the oxide layer, and
a salt is formed by the salt formation reaction.

20 . The method of claim 19 , wherein the formed salt is removed by a salt decomposition reaction during the thermally treating of the substrate.

21 . An apparatus for manufacturing a display apparatus, the apparatus comprising:
a first chamber in which a substrate is processed; a first supply line that separately supplies a hydrofluoric acid gas and an ammonia gas to inside of the first chamber; a first shower head configured to spray the hydrofluoric acid gas and the ammonia gas received from the first supply line toward the substrate; a first gas diffusion plate arranged between the first supply line and the first shower head; and a stage on which the substrate is seated.

22 . The apparatus of claim 21 , wherein
the first supply line comprises a first sub supply line and a second sub supply line, and the first sub supply line is configured to supply the hydrofluoric acid gas to inside of the first chamber, and the second sub supply line is configured to supply the ammonia gas to inside of the first chamber.

23 . The apparatus of claim 22 , wherein the apparatus is configured to mix the hydrofluoric acid gas and the ammonia gas within the first shower head or directly above the first shower head.

24 . The apparatus of claim 21 , further comprising a first pressure adjuster configured to adjust an internal pressure of the first chamber.

25 . The apparatus of claim 21 , further comprising:
a cooling plate arranged above the stage or under the stage; and an upper heater arranged within the first chamber.

26 . The apparatus of claim 25 , wherein the upper heater is provided on a top of the first chamber.

27 . The apparatus of claim 26 , wherein the upper heater heats the hydrofluoric acid gas to a temperature of about 60° C. to about 100° c.

28 . The apparatus of claim 21 , further comprising:
a second chamber configured to thermally treat the substrate therein; a second supply line configured to supply gases to the second chamber; and a susceptor arranged within the second chamber and configured to support the substrate.

29 . The apparatus of claim 28 , wherein the susceptor comprises a heater configured to heat the substrate.

30 . The apparatus of claim 29 , wherein the susceptor is further configured to move up and down.

Assignees

• Samsung Display Co Ltd
• Tes Co Ltd
• Ltc Co Ltd

Inventors

• Jo Gugrae
• Kim Hyoungsik
• Cho Woojin
• Lee Jongsoon
• Lee Hongjae
• Kim Kyusang
• Kim Seonjeong
• Ma Heejeon
• Park Wonil
• Byun Kicheon
• Lee Woojin

Classifications

• H10P70/125 Primary

  with gaseous HF · CPC title

• H10P50/283 Primary

  by chemical means · CPC title

• H10D86/0212

  comprising manufacture, treatment or coating of substrates · CPC title

• H10P72/7612

  characterised by lifting arrangements, e.g. lift pins · CPC title

• H10P72/0421

  for drying etching · CPC title