Gas treatment apparatus

Patent metadata

Field	Value
Publication number	US-2022301821-A1
Application number	US-202217686609-A
Country	US
Kind code	A1
Filing date	Mar 4, 2022
Priority date	Mar 17, 2021
Publication date	Sep 22, 2022
Grant date	—

Abstract

There is provided a gas treatment apparatus for performing gas treatment on a substrate. The gas treatment apparatus includes: a chamber in which the substrate is accommodated; a gas supply mechanism configured to individually supply a fluorine-containing gas and an alkaline gas; and a gas introduction member configured to cause the fluorine-containing gas and the alkaline gas supplied from the gas supply mechanism to merge with each other and introduce a mixed gas in which the fluorine-containing gas and the alkaline gas are mixed into the chamber. A portion of the gas introduction member including a merging point of the fluorine-containing gas and the alkaline gas is made of an aluminum-based material. A resin coating is formed on at least the portion including the merging point.

First claim

What is claimed is:

1 . A gas treatment apparatus for performing gas treatment on a substrate, the gas treatment apparatus comprising:
a chamber in which the substrate is accommodated; a gas supply mechanism configured to individually supply a fluorine-containing gas and an alkaline gas; and a gas introduction member configured to cause the fluorine-containing gas and the alkaline gas supplied from the gas supply mechanism to merge with each other and introduce a mixed gas in which the fluorine-containing gas and the alkaline gas are mixed into the chamber, wherein a portion of the gas introduction member including a merging point of the fluorine-containing gas and the alkaline gas is made of an aluminum-based material, and wherein a resin coating is formed on at least the portion including the merging point.

2 . The gas treatment apparatus of claim 1 , wherein the resin coating is formed at the merging point and a portion through which the mixed gas of the fluorine-containing gas and the alkaline gas flows.

3 . The gas treatment apparatus of claim 2 , wherein the gas introduction member comprises:
a main body made of an aluminum-based material; a first gas introducer and a second gas introducer configured to introduce the fluorine-containing gas and the alkaline gas, respectively; and a gas flow path, through which the mixed gas flows, provided inside the main body and including the merging point, and wherein the resin coating is formed on an inner surface of the gas flow path in the main body.

4 . The gas treatment apparatus of claim 3 , wherein the gas introduction member is a shower head configured to eject gas into the chamber in a shower form, and
wherein the main body includes a first plate including the gas flow path, a gas diffusion space into which the mixed gas is introduced from the gas flow path, and a second plate including gas ejection holes configured to eject the mixed gas from the gas diffusion space into the chamber.

5 . The gas treatment apparatus of claim 4 , wherein the resin coating is also formed on an inner surface of the gas diffusion space.

6 . The gas treatment apparatus of claim 4 , further comprising:
a gas injection plug made of a resin, provided in a portion in which the mixed gas flows into the gas diffusion space from the gas flow path, and configured to inject the mixed gas into the gas diffusion space.

7 . The gas treatment apparatus of claim 6 , wherein the gas injection plug is made of PFA.

8 . The gas treatment apparatus of claim 3 , wherein the gas introduction member further includes a merging portion provided in the gas flow path and configured to cause the alkaline gas introduced from the second gas introducer to merge with the fluorine-containing gas introduced into the gas flow path from the first gas introducer, and
wherein the merging portion includes a gas ejection member configured to eject the alkaline gas into the gas flow path along a flow of the fluorine-containing gas.

9 . The gas treatment apparatus of claim 1 , wherein the chamber is made of an aluminum-based material, and the resin coating is also formed on an inner surface of the chamber.

10 . The gas treatment apparatus of claim 1 , wherein the resin coating is made of PFA.

11 . A gas treatment apparatus for performing a gas treatment on a substrate, the gas treatment apparatus comprising:
a chamber in which the substrate is accommodated; a gas supply mechanism configured to individually supply a fluorine-containing gas and an alkaline gas; and a gas introduction member configured to cause the fluorine-containing gas and the alkaline gas supplied from the gas supply mechanism to merge with each other and introduce a mixed gas in which the fluorine-containing gas and the alkaline gas are mixed into the chamber, wherein the gas introduction member further comprises:
a main body made of an aluminum-based material;
a first gas introducer and a second gas introducer configured to introduce the fluorine-containing gas and the alkaline gas, respectively;
a gas flow path provided inside the main body; and
a merging portion configured to cause the alkaline gas introduced from the second gas introducer to merge into the gas flow path into which the fluorine-containing gas is introduced from the first gas introducer, and
wherein the merging portion includes a gas ejection member configured to eject the alkaline gas into the gas flow path along a flow of the fluorine-containing gas.

12 . The gas treatment apparatus of claim 11 , wherein the gas introduction member is a shower head configured to eject gas into the chamber in a shower form, and
wherein the main body includes a first plate including the gas flow path, a gas diffusion space into which the mixed gas is introduced from the gas flow path, and a second plate including gas ejection holes configured to eject the mixed gas from the gas diffusion space into the chamber.

13 . The gas treatment apparatus of claim 12 , further comprising:
a gas injection plug made of a resin, provided in a portion in which the mixed gas flows into the gas diffusion space from the gas flow path, and configured to inject the mixed gas into the gas diffusion space.

14 . The gas treatment apparatus of claim 13 , wherein the gas injection plug is made of PFA.

15 . The gas treatment apparatus of claim 11 , wherein the second gas introducer includes a secondary gas flow path extending downward to a position below the gas flow path and horizontally extending toward the merging portion from the position, wherein the secondary gas flow path is connected upward to a bottom of the gas ejection member at a position corresponding to the gas ejection member.

16 . The gas treatment apparatus of claim 11 , wherein, in the gas flow path, a distance between an ejected flow of the alkaline gas from the gas ejection member and a wall of the gas flow path is 2.5 mm or more.

17 . The gas treatment apparatus of claim 11 , wherein a resin coating is formed on an inner surface of the gas flow path.

18 . The gas treatment apparatus of claim 17 , wherein the resin coating is made of PFA.

19 . The gas treatment apparatus of claim 1 , wherein the fluorine-containing gas is at least one selected from HF gas, F 2 gas, ClF 3 gas, and NF 3 gas, and the alkaline gas is at least one selected from NH 3 gas and an amine gas.

20 . The gas treatment apparatus of claim 19 , wherein the fluorine-containing gas is HF gas, the alkaline gas is NH 3 gas, and the gas treatment is a treatment for etching a silicon oxide-based material existing on the substrate.

Assignees

• Tokyo Electron Ltd

Inventors

• Saegusa Yuji
• Handa Tatsuya
• Sasahara Reiko
• Asahi Kenshiro
• Nishimura Kazuaki
• Yoshimura Akihiro
• Furusawa Masaki

Classifications

• H10P72/0421 Primary

  for drying etching · CPC title

• H10P50/283

  by chemical means · CPC title

• H01J37/3244 Primary

  Gas supply means · CPC title

• H01J2237/334

  Etching · CPC title

• H01J37/32495

  Means for protecting the vessel against plasma · CPC title