Hybrid ion source for aluminum ion generation using a target holder and a solid target

Patent metadata

Field	Value
Publication number	US-2023369008-A1
Application number	US-202217740861-A
Country	US
Kind code	A1
Filing date	May 10, 2022
Priority date	May 10, 2022
Publication date	Nov 16, 2023
Grant date	—

Abstract

An ion source that is capable of different modes of operation is disclosed. The ion source includes an insertable target holder includes a hollow interior into which the solid dopant material is disposed. The target holder may a porous surface at a first end, through which vapors from the solid dopant material may enter the arc chamber. The porous surface inhibits the passage of liquid or molten dopant material into the arc chamber. The target holder is also constructed such that it may be refilled with dopant material when the dopant material within the hollow interior has been consumed. A solid target is also disposed in the arc chamber. When the insertable target holder is used, multicharged ions are created. When the insertable target holder is retracted, single charged ions are created by only etching the solid dopant-containing compound.

First claim

What is claimed is:

1 . An indirectly heated cathode ion source, comprising:
an arc chamber, comprising a plurality of walls and adapted to contain a solid target, wherein the solid target is a compound containing a dopant of interest; an indirectly heated cathode disposed in the arc chamber; an insertable target holder to hold the dopant of interest; an actuator to move the target holder from an extended position within the arc chamber to a retracted position outside the arc chamber; a valve in communication with the arc chamber and adapted to connect to a gas source; and a controller in communication with the actuator and the valve so as to operate the indirectly heated cathode ion source in one of a plurality of modes.

2 . The indirectly heated cathode ion source of claim 1 , wherein the plurality of modes comprises a single charge mode to create ions of a species having a single charge and a multicharge mode to create ions of the species having two or more charges.

3 . The indirectly heated cathode ion source of claim 2 , wherein the species comprises a metal.

4 . The indirectly heated cathode ion source of claim 2 , wherein in the single charge mode, the controller moves the target holder to the retracted position, and opens the valve.

5 . The indirectly heated cathode ion source of claim 2 , wherein in the multicharge mode, the controller moves the target holder to the extended position, and opens the valve.

6 . The indirectly heated cathode ion source of claim 1 , further comprising the solid target.

7 . The indirectly heated cathode ion source of claim 6 , wherein the solid target is mounted on one of the plurality of walls.

8 . The indirectly heated cathode ion source of claim 6 , wherein the solid target is mounted on an end of the arc chamber opposite the indirectly heated cathode.

9 . The indirectly heated cathode ion source of claim 6 , wherein the insertable target holder holds a pure metal and the solid target comprises a ceramic material containing the metal.

10 . The indirectly heated cathode ion source of claim 9 , wherein the metal is aluminum and the ceramic material is aluminum oxide or aluminum nitride.

11 . The indirectly heated cathode ion source of claim 1 , wherein the gas source contains a halogen containing species.

12 . A method of operating an indirectly heated cathode ion source in a plurality of modes, wherein the indirectly heated cathode ion source comprises a controller, an arc chamber and an insertable target holder holding a dopant of interest, and wherein a solid target, which is a compound comprising the dopant of interest, is disposed in the arc chamber, the method comprising:
selecting a desired mode; and
using the controller to configure the indirectly heated cathode ion source to operate in the desired mode,
wherein to operate in a multicharge mode, wherein the multicharge mode is used to create ions of a species having two or more charges, the controller extends the target holder into the arc chamber and enables a flow of a gas into the arc chamber so as to vaporize and ionize the dopant of interest disposed in the target holder; and
wherein to operate in a single charge mode, wherein the single charge mode is to create ions of the species having a single charge, the controller retracts the target holder from the arc chamber and enables the flow of the gas into the arc chamber so that the gas etches the solid target.

13 . The method of claim 12 , wherein the species comprises a metal.

14 . The method of claim 12 , wherein the gas comprises a halogen containing species.

15 . The method of claim 12 , wherein the insertable target holder holds a pure metal and the solid target comprises a ceramic material comprising the metal.

16 . The method of claim 15 , wherein the metal is aluminum and the ceramic material is aluminum oxide or aluminum nitride.

17 . An indirectly heated cathode ion source, comprising:
an arc chamber, comprising a plurality of walls and adapted to contain a solid target; an indirectly heated cathode disposed in the arc chamber, wherein the indirectly heated cathode is used to generate a plasma in the arc chamber; and a controller configured to operate the indirectly heated cathode ion source in one of a plurality of modes, wherein in multicharge mode, the controller configures the indirectly heated cathode ion source such that the plasma ionizes a pure metal, and in single charge mode, the controller configures the indirectly heated cathode ion source such that the plasma etches and ionizes the solid target, wherein the solid target is a ceramic material comprising the metal.

18 . The indirectly heated cathode ion source of claim 17 , wherein the metal is aluminum, and the solid target comprises aluminum oxide or aluminum nitride.

19 . The indirectly heated cathode ion source of claim 17 , wherein the controller controls an actuator so as to insert and remove the pure metal from the arc chamber.

Assignees

• Applied Materials Inc

Inventors

• Wright Graham
• Patel Shardul S

Classifications

• H01J37/08 Primary

  Ion sources; Ion guns · CPC title

• H01J37/32055

  Arc discharge · CPC title

• H01J37/3244

  Gas supply means · CPC title

• H01J37/342 Primary

  Hollow targets · CPC title

• H01J37/3426

  Material · CPC title