Spherical inorganic particles having surface bumps formed thereon, and method of manufacturing same

US2022235252A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2022235252-A1
Application numberUS-202117611806-A
CountryUS
Kind codeA1
Filing dateFeb 26, 2021
Priority dateFeb 27, 2020
Publication dateJul 28, 2022
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

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The inorganic particle according to the present invention is composed of aggregation of crystalline and amorphous small particles and has a spherical and smooth surface. The spherical appearance, low crystallinity and narrow particle size distribution of inorganic particle are more advantageous in reducing scratch defects in the CMP process. In addition, since the small particles on the surface of the inorganic particle provide more active sites, the inorganic particle has an excellent removal rate, so it is advantageous as a next-generation CMP abrasive.

First claim

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1 . An inorganic particle formed by aggregation of a plurality of small particles, wherein the small particle has a mixed phase of a crystalline phase and an amorphous phase and has a degree of crystallinity of 90% or less. 2 . The inorganic particle according to claim 1 , wherein the small particle has a particle diameter of 10 nm or less. 3 . The inorganic particle according to claim 1 , wherein the inorganic particle has a density of 3.0 to 5.0 g/ml, an average particle diameter of 30 to 1000 nm, and a standard deviation of the particle diameter of 20 or less. 4 . The inorganic particle according to claim 1 , wherein the inorganic particle has an isoelectric point of pH 5 to 7. 5 . The inorganic particle according to claim 1 , wherein the inorganic particle has a zeta potential of +30 to +50 mV or −30 to −50 mV in an aqueous dispersion of pH 4. 6 . The inorganic particle according to claim 1 , wherein the inorganic particle is composed of an oxide of one or more elements selected from the group consisting of Ga, Sn, As, Sb, Ce, Si, Al, Co, Fe, Li, Mn, Ba, Ti, Sr, V, Zn, La, Hf, Ni and Zr. 7 . The inorganic particle according to claim 1 , wherein the inorganic particle is CeO 2 particle wherein the ratio of Ce 3+ /Ce 4+ is 40 to 60. 8 . A method of manufacturing the inorganic particle of claim 1 , comprising: (a) dissolving a self-assembling surfactant in a solvent; (b) dissolving or dispersing an inorganic precursor in the solvent before, after, or simultaneously with the step (a) to prepare an inorganic precursor solution; and (c) forming small particles having a mixed phase of a crystalline phase and an amorphous phase in the shell formed by the surfactant through the self-assembly reaction of the inorganic precursor and the surfactant, and then forming an inorganic particle by aggregation of a plurality of the small particles. 9 . The method of manufacturing the inorganic particle according claim 8 , wherein the method further comprises treating the inorganic particle obtained in the step (c) with an acid and a base to obtain the inorganic particle having a controlled surface charge. 10 . The method of manufacturing the inorganic particle according claim 8 , wherein the self-assembling surfactant is at least one selected from a cationic surfactant, an anionic surfactant and an amphoteric surfactant having a charge capable of ionically bonding with the inorganic precursor, which has a functional group that allows a condensation reaction or crosslinking reaction. 11 . The method of manufacturing the inorganic particle according claim 10 , wherein the functional group that allows a condensation reaction or crosslinking reaction is at least one selected from the group consisting of an amide group, a nitro group, an aldehyde group, and a carbonyl group. 12 . The method of manufacturing the inorganic particle according claim 8 , wherein the self-assembling surfactant has a structure of the following formula 1 wherein R 1 and R 3 are independently a hydrogen atom, a C 1 -C 10 alkyl group or a C 1 -C 10 alkoxy group, R 2 is a substituent of formula 2 below, and n is 2 or more, wherein R 4 and R 5 are independently a hydrogen atom, a C 1 -C 10 alkyl group or a C 1 -C 10 alkoxy group, R 6 is a C 1 -C 10 alkylene group or a single covalent bond, and * represents a connection site. 13 . The method of manufacturing the inorganic particle according claim 8 , wherein the solvent is water or a mixed solvent of water and a solvent having compatibility with water. 14 . An aqueous dispersion in which the inorganic particles of claim 1 are dispersed in water. 15 . The aqueous dispersion according claim 14 , wherein the aqueous dispersion is a slurry for CMP.

Assignees

Inventors

Classifications

  • Composite particles, e.g. coated particles · CPC title

  • Aqueous liquid suspensions · CPC title

  • containing abrasives or grinding agents {(abrasives as such C09K3/14; polishing of semi-conductors H10P52/40)} · CPC title

  • C09K3/1409Primary

    Abrasive particles per se (preparation of diamond C01B32/25) · CPC title

  • Aqueous dispersions (C09G1/02 takes precedence) · CPC title

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What does patent US2022235252A1 cover?
The inorganic particle according to the present invention is composed of aggregation of crystalline and amorphous small particles and has a spherical and smooth surface. The spherical appearance, low crystallinity and narrow particle size distribution of inorganic particle are more advantageous in reducing scratch defects in the CMP process. In addition, since the small particles on the surface…
Who is the assignee on this patent?
Bead Origin Inc, Research & Business Found Sungkyunkwan Univ
What technology area does this patent fall under?
Primary CPC classification C09K3/1409. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Jul 28 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).