Acidic aqueous binary silver-bismuth alloy electroplating compositions and methods

US2022112619A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2022112619-A1
Application numberUS-202117556037-A
CountryUS
Kind codeA1
Filing dateDec 20, 2021
Priority dateDec 10, 2019
Publication dateApr 14, 2022
Grant date

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Abstract

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Aqueous acid binary silver-bismuth alloy electroplating compositions and methods enable electroplating silver rich binary silver-bismuth deposits. The aqueous acid binary silver-bismuth alloy electroplating compositions include 5-membered heterocyclic nitrogen compounds with a thiol functionality which enable deposition of the silver rich binary silver-bismuth alloys. The silver rich silver-bismuth deposits are matte to semi-bright, uniform and have a low coefficient of friction.

First claim

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1 - 6 . (canceled) 7 . A method of electroplating a binary silver-bismuth alloy on a substrate comprising: a) providing the substrate; b) contacting the substrate with a binary silver-bismuth alloy electroplating composition comprising a source of silver ions, a source of bismuth ions, wherein the binary silver-bismuth alloy electroplating composition is free of additional alloying metals and a 5-membered aromatic heterocyclic nitrogen compounds having general formula: wherein Q 1 -Q 4 can be a substituted or unsubstituted nitrogen or a substituted or unsubstituted carbon with the proviso that at least two of Q 1 -Q 4 are nitrogen, wherein substituent groups include, but are not limited to, (C 1 -C 4 )alkyl, amino group, aminoalkyl group, carboxyl, carboxy(C 1 -C 4 )alkyl or alkylsulfonate, an aliphatic thiol terminal compound selected from the group consisting of thioglycolic acid, 2-mercaptopropionic acid, 3-mercaptopropionic acid, cysteine, mercaptosuccinic acid, 3-mercapto-l-propanesulfonic acid, 2-mercaptoethanesulfonic acid, salts of the thiol terminal compounds, and mixtures thereof, and a pH of less than 7; and c) applying an electric current to the binary silver-bismuth alloy electroplating composition and substrate to electroplate a binary silver-bismuth deposit on the substrate. 8 . The method of claim 7 , wherein the 5-membered aromatic heterocyclic nitrogen compound is selected from the group consisting of 3-mercapto-1,2,4-triazole, 3-amino-1,2,4-triazole-5-thiol, 3-amino-5-mercapto-1,2,4-triazole, 3-mercapto-4-methyl-4H-1,2,4-triazole, 1H-imidazole-2-thiol, salts of the 5-membered aromatic heterocyclic nitrogen compounds, and mixtures thereof. 9 . The method of claim 7 , wherein the binary silver-bismuth alloy electroplating composition further comprises a thioether or mixtures thereof. 10 . (canceled) 11 . An article comprising a binary silver-bismuth alloy layer adjacent a surface of a substrate made according to the method of claim 7 , wherein the binary silver-bismuth alloy layer comprises 90% to 99.8% silver and 0.2% to 10% bismuth, and has a coefficient of friction of 1 or less.

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Classifications

  • C25D3/46Primary

    of silver · CPC title

  • characterised by the organic bath constituents used · CPC title

  • C25D3/64Primary

    containing more than 50% by weight of silver · CPC title

  • Alloys based on silver · CPC title

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What does patent US2022112619A1 cover?
Aqueous acid binary silver-bismuth alloy electroplating compositions and methods enable electroplating silver rich binary silver-bismuth deposits. The aqueous acid binary silver-bismuth alloy electroplating compositions include 5-membered heterocyclic nitrogen compounds with a thiol functionality which enable deposition of the silver rich binary silver-bismuth alloys. The silver rich silver-bis…
Who is the assignee on this patent?
Rohm & Haas Elect Mat
What technology area does this patent fall under?
Primary CPC classification C25D3/46. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Thu Apr 14 2022 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).